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Scanning Helium Ion Microscope

  • Keiko OnishiEmail author
  • Daisuke Fujita
Chapter

Abstract

Scanning helium ion microscope (SHIM) is based on the similar principle with field emission scanning electron microscope (FE-SEM) (Guo in Scanning Helium Ion Microscopy, Characterization of Materials. Wiley, pp. 1–9, 2012 [1]). The difference between them is that scanning beam of SHIM is a positively charged helium ion (He+) beam from a gas field ion source (GFIS), but not a negatively charged electron beam. An enlarged image of the sample surface is obtained like FE-SEM. Helium gas is field-ionized almost only from the top-most atoms by applying a high voltage to a sharp tip made of monocrystalline refractory metals in a diluted helium gas. Only the He+ beam emitted from a single atom is focused by the ion optical system and is scanned over the sample surfaces. If a backscattered ion detector is equipped, the secondary electrons (SE) and backscattered ions (BSI) can be acquired simultaneously. SHIM can observe the sample image with less current than FE-SEM. If the neutralizing flood gun is equipped, it is easier to observe insulating materials than FE-SEM. SHIM can also be used for direct nanofabrication like focused ion beam (FIB) systems. Since He+ beam does not have such a sputtering capability as a gallium ion beam, it cannot process on the micron-scale, but nanoscale ultrafine modification utilizing the nanoscale-focused He+ beam is possible. If a gas introduction system is installed, deposition of gas-decomposition microstructures by a precisely controlled He+ beam is possible

Keywords

Microscope Ion beam Secondary electron Nanoscale fabrication 

References

  1. 1.
    Guo, H.X., Fujita, D.: Scanning Helium Ion Microscopy, Characterization of Materials, pp. 1–9. Wiley (2012)Google Scholar
  2. 2.
    Onishi, K.: Development and Shared Use of Advanced Nanomaterial Evaluation Techniques Using Scanning Helium Ion Microscope. Kenbikyo 48, 154–158 (2013)Google Scholar
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    Guo, H.X., Wang, C.X., Miyazawa, K., Masuda, H., Fujita, D.: Thermal decomposition of fullerene nanowhiskers protected by amorphous carbon mask. Scientific Reports 6, 38760 (2016)CrossRefGoogle Scholar
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    Sakai, C., Ishida, N., Masuda, H., Nagano, S., Kitahara, M., Fujita, D.: Active voltage contrast imaging of cross-sectional surface of multilayer ceramic capacitor using helium ion microscopy. Appl. Phys. Lett. 109, 051603 (2016)CrossRefGoogle Scholar

Copyright information

© Springer Nature Singapore Pte Ltd. 2018

Authors and Affiliations

  1. 1.Research Center for Advanced Measurement and CharacterizationNational Institute for Materials ScienceIbarakiJapan

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