Hydrogenated silicon clusters for deposition on solid surfaces

  • M. O. Watanabe
  • N. Uchida
  • T. Kanayama
Conference paper


We have investigated formation characteristics of stable hydrogenated Si cluster ions, Open image in new window , for deposition on solid substrates. The Open image in new window clusters were grown from silane gas in an ion trap developed for cluster growth, and transported to the solid substrate through an electrostatic quadrupole deflector. Several kinds of the clusters (n = 4 − 10) were grown and transported to the solid substrate. Among them, Open image in new window cluster ion beam was focused to less than 3 mm in diameter on the solid substrate with a deposition energy of 3 eV/Si atom, the beam current obtained was more than 30 pA, which is in the range useful for observation of cluster adsorption structures on solid surfaces.


36.40.Qv Stability and fragmentation of clusters 36.40.Wa Charged clusters 61.46.+w Clusters, nanoparticles, and nanocrystalline materials 


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Copyright information

© Springer-Verlag Italia 1999

Authors and Affiliations

  • M. O. Watanabe
    • 1
  • N. Uchida
    • 2
  • T. Kanayama
    • 2
  1. 1.Joint Research Center for Atom Technology (JRCAT) — Angstrom Technology PartnershipTsukubaJapan
  2. 2.JRCAT — National Institute for Advanced Interdisciplinary ResearchTsukubaJapan

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