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Progress in Ion Projection Lithography

  • G. Stengl
  • H. Löschner
  • E. Hammel
Conference paper
Part of the Springer Series in Solid-State Sciences book series (SSSOL, volume 83)

Abstract

Ion protection lithography (IPL) uses demagnifying ion optics to project open stencil mask structures onto a substrate with reduced (.. 5x, 10x, ..) scale [1]. The IPL technique offers high throughput potential by using duoplasmatron ion sources with high angular current densities [2] and with virtual source sizes of less than 10 pm. Thus, for organic resists, chip exposure times of ≤ 0.1 sec are easily obtained.

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Copyright information

© Springer-Verlag Berlin Heidelberg 1988

Authors and Affiliations

  • G. Stengl
    • 1
  • H. Löschner
    • 1
  • E. Hammel
    • 1
  1. 1.IMS — Ion Microfabrication Systems GmbHViennaAustria

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