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Growth Mechanism and Structural Characterization of Nano-crystalline Diamond (NCD) and Micro-crystalline Diamond (MCD) Films Deposited on Silicon Substrates

  • Amal DasEmail author
  • Deleep R. Nair
  • Amitava Dasgupta
  • M. S. Ramachandra Rao
Conference paper
Part of the Springer Proceedings in Physics book series (SPPHY, volume 215)

Abstract

In this work, diamond thin films were deposited using hot filament chemical vapour deposition (HFCVD) technique on Si substrate. Diamond films are typically classified into nano-crystalline diamond (NCD; grain size <100 nm) and micro-crystalline diamond (MCD; grain size >500 nm) based on their grain size. Process parameters such as the ratio of methane and hydrogen concentration (%CH4/H2) and chamber pressure were varied to grow MCD and NCD films. NCD and MCD films will be used as substrate to improve the performance of MEMS resonator. Structural characteristics and quality of the MCD and NCD films were confirmed using Raman spectroscopy and the surface features were imaged using high resolution scanning electron microscopy (HRSEM).

Notes

Acknowledgements

The authors would like to thank Department of Information Technology (DeitY), Govt. of India for their support. MSR would like to thank the financial support of DST, New Delhi (Grant # SR/NM/NAT-02/2005).

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Copyright information

© Springer Nature Switzerland AG 2019

Authors and Affiliations

  • Amal Das
    • 1
    Email author
  • Deleep R. Nair
    • 1
  • Amitava Dasgupta
    • 1
  • M. S. Ramachandra Rao
    • 2
  1. 1.Microelectronics and MEMS Laboratory, Department of Electrical EngineeringIIT MadrasChennaiIndia
  2. 2.Nano Functional Materials Technology Centre, Materials Science Research Centre and Department of PhysicsIIT MadrasChennaiIndia

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