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Investigation on the Variation of Sheet Resistance of RF Deposited Nichrome Thin Films with Deposition Parameters

  • Ajay Kumar VisvkarmaEmail author
  • Robert Laishram
  • Hemant Kumar Saini
  • Rajeev Kumar Sawal
  • Sonalee Kapoor
  • D. S. Rawal
Conference paper
Part of the Springer Proceedings in Physics book series (SPPHY, volume 215)

Abstract

Nichrome thin films were deposited by Radio Frequency (RF) magnetron sputtering with variable RF power and argon gas pressure at room temperature. It was found that the sheet resistance (Rsh) varied with different deposition parameters. Energy Dispersive Spectroscopy (EDS) results show that the composition of deposited films were same. Scanning Electron Microscopy (SEM) characterization reveals the formation of clusters with variable size during the deposition which may be contributing to the change in the sheet resistance of the films.

Keywords

NiCr RF sputtering Sheet resistance Cluster boundary 

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Copyright information

© Springer Nature Switzerland AG 2019

Authors and Affiliations

  • Ajay Kumar Visvkarma
    • 1
    Email author
  • Robert Laishram
    • 1
  • Hemant Kumar Saini
    • 1
  • Rajeev Kumar Sawal
    • 1
  • Sonalee Kapoor
    • 1
  • D. S. Rawal
    • 1
  1. 1.Solid State Physics LaboratoryTimarpur, DelhiIndia

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