Development of Silicon Based Microchannel for Gas Chromatograph Column
The current study develop a MEMS–based micro-GC system incorporating a serpentine column with dimensions of 2 m × 200 µ × 115 µ (length × width × depth). The channel is etched into a silicon substrate with dimensions 28 × 28 mm2 using wet etching. The device is sealed by anodic bonding technique using Pyrex glass wafer. This fabrication method raises the possibility for a low cost mass production.
The authors would like to thanks The Director SSPL for giving opportunity to work in this area.