TiO2 Thin Film Optimization for Ammonia Gas Sensing
The influence of Argon to Oxygen ratio on Ammonia sensing properties of reactive DC magnetron sputtered TiO2 thin film has been investigated. The film deposited at highest ratio exhibited mixed phase (Anatase and Rutile) while the film deposited at the lowest ratio showed no crystallinity as analyzed by X-ray diffraction (XRD). The mixed phase TiO2 film showed enhanced response towards NH3 in the concentration range of 50 ppb (6.6%) to 3 ppm (347%) at 250 °C, which could be correlated to the crystalline phase of TiO2. The roughness of this film was the highest (1.55 nm) among others owing to the morphology of the film.
The authors would like to thank the Ministry of Electronics and Information Technology, Government of India for funding this work. We would also like to thank National Nano Fabrication Facility (NNFC) and Micro and Nano Characterization Facility (MNCF) at Centre for Nano Science and Engineering (CeNSE), Indian Institute of Science, Bangalore, India for the technical support.
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