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Introducing an Inductive Loop Sensor as an Alternative to Record the Phenomena of a Dense Plasma Focus of 400 J

  • Luis Orellana
  • Jorge ArdilaEmail author
  • Gonzalo Avaria
  • Benjamín Cevallos
  • Cristian Pavez
  • Roger Schurch
  • Leopoldo Soto
Conference paper
Part of the Lecture Notes in Electrical Engineering book series (LNEE, volume 598)

Abstract

Pulsed plasma discharges are of interest for their capability to produce pulsed high energy radiation and particle beams. One of them is the dense plasma focus, a device that has renewed interest for physics research and possible industrial applications. The plasma produced with this device corresponds to the z-pinch phenomena and lasts between 1–10 ns. Electrical quantities such as the voltage across the electrodes of the vacuum chamber where the plasma dynamic takes place and the circuit current are used for the diagnostic of these devices. The short duration of the high density plasma that is produced implies a challenge when choosing a proper sensor. Typically, Rogowski coils wrapped around a conductor are used for measuring the time derivative of the circuit current. The reproducibility of Rogowski coils and variation of its frequency response due to movements can be an issue. An inductive loop sensor was developed as an alternative to measure fast and low amplitude transients of partial discharges. In this work, the use of the inductive loop sensor is proposed as an alternative sensor for the dense plasma focus operation measurement. Simultaneous measurements of both the Rogowski coil and inductive loop sensor were carried out on a low energy dense plasma focus. A comparison between both sensors was made in time and time-frequency domains. Wavelet transform was used in the time-frequency analysis. Further studies regarding the pinch detection were made with correlations between the signal values at this particular instant of the device operation. The results indicated that similar results in the characterization of the dense plasma focus operation can be obtained with the inductive loop sensor. In terms of the frequency response at time of pinch both sensors yielded similar results. A linear tendency between the signal values at time of pinch was found. Future work will be carried out to fully adapt the inductive loop sensor for its application in pulsed power technology.

Keywords

Inductive loop sensor Plasma focus Fast current measurement 

Notes

Acknowledgments

This work was supported by “Fondecyt Iniciación” 11160115 and “Dirección de Postgrados y Programas” of Federico Santa Maria Technical University under PIIC grant.

References

  1. 1.
    Mather, J.: In: Methods in Experimental Physics, pp. 187–249, vol. 9. Elsevier (1971)Google Scholar
  2. 2.
    Bernard, A., Bruzzone, H., Choi, P., Chuaqui, H., Gribkov, V., Herrera, J., Hirano, K., Krejci, A., Lee, S., Luo, C., et al.: J. Moscow Phys. Soc. 8, 93 (1998)Google Scholar
  3. 3.
    Haines, M.: Plasma Phys. Control. Fusion 53(9), 093001 (2011)CrossRefGoogle Scholar
  4. 4.
    Soto, L.: Plasma Phys. Control. Fusion 47(5A), A361 (2005)CrossRefGoogle Scholar
  5. 5.
    Pellinen, D.G., Di Capua, M.S., Sampayan, S.E., Gerbracht, H., Wang, M.: Rev. Sci. Instrum. 51(11), 1535 (1980)CrossRefGoogle Scholar
  6. 6.
    Robles, G., Martinez-Tarifa, J.M., Rojas-Moreno, M.V., Sanz-Feito, J.: IEEE Trans. Instrum. Measur. 58(11), 3907 (2009)CrossRefGoogle Scholar
  7. 7.
    Ardila-Rey, J., Barrueto, A., Zerene, A., Castro, B., Ulson, J., Mas’ud, A., Valdivia, P.: Sensors 18(7), 2324 (2018)CrossRefGoogle Scholar
  8. 8.
    Ardila-Rey, J., Rojas-Moreno, M., Martínez-Tarifa, J., Robles, G.: Sensors 14(2), 3408 (2014)CrossRefGoogle Scholar
  9. 9.
    Silva, P., Moreno, J., Soto, L., Birstein, L., Mayer, R.E., Kies, W.: Appl. Phys. Lett. 83(16), 3269 (2003)CrossRefGoogle Scholar
  10. 10.
    Bruzzone, H., Kelly, H., Moreno, C.: IEEE Trans. Plasma Sci. 18(4), 689 (1990)CrossRefGoogle Scholar
  11. 11.
    Bruzzone, H., Acuña, H., Barbaglia, M., Milanese, M., Clausse, A.: J. Fusion Energy 36(2–3), 87 (2017)CrossRefGoogle Scholar
  12. 12.
    Lilly, J.M.: Proc. R. Soc. A: Math. Phys. Eng. Sci. 473(2200), 20160776 (2017)CrossRefGoogle Scholar
  13. 13.
    Piriaei, D., Mahabadi, T., Javadi, S., Ghoranneviss, M.: Phys. Plasmas 24(8), 083508 (2017)CrossRefGoogle Scholar
  14. 14.
    Gerdin, G., Tanis, M., Venneri, F.: Plasma Phys. Control. Fusion 28(3), 527 (1986)CrossRefGoogle Scholar
  15. 15.
    Escalona, I., Avaria, G., Díaz, M., Ardila-Rey, J., Moreno, J., Pavez, C., Soto, L.: Energies 10(9), 1415 (2017)CrossRefGoogle Scholar

Copyright information

© Springer Nature Switzerland AG 2020

Authors and Affiliations

  • Luis Orellana
    • 1
  • Jorge Ardila
    • 1
    Email author
  • Gonzalo Avaria
    • 2
  • Benjamín Cevallos
    • 1
  • Cristian Pavez
    • 2
  • Roger Schurch
    • 1
  • Leopoldo Soto
    • 2
  1. 1.Universidad Técnica Federico Santa MaríaSantiagoChile
  2. 2.Chilean Nuclear Energy CommissionSantiagoChile

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