Advertisement

Abstract

This paper specified the research results of internal stress with films of water and UV water varnish formed on a solid base. Internal stress occurring by the change of volume in the hardening and adhesion between film and substrate. The hardening process of the studied water-based varnish is achieved by UV radiation. The console method was used to determine the internal strain. This method is based on the principle that one end of the thin elastic narrow panel is fixed. The influence of the film thickness as well as internal stress kinetics has been controlled. In the kinetics of the internal stresses on investigated water and UV water varnish, it is possible to notice the period in which we have an intense evaporation of the volatile components and the first occurrence of the internal stresses, the time of the internal stresses to reach the maximum, the period of maximum retention stress at the achieved level.

Keywords

UV hardening Internal stress Water varnish Cantilever method Film thickness 

References

  1. 1.
    Axelsen, S.T., et al.: Topcoat flaking - a mechanism study. Party 1; Laboratory testing internal stress, mechanical properties, adhesion and ageing. Corrosion, March 16–20, New Orleans, USA, p. 14 (2008)Google Scholar
  2. 2.
    Grigore, E., Ruset, C., Short., Hoeft, D., Dong, H., Li, X.Y., Bellt, T.: In situ investigation of the internal stress within the nc-Ti2 N/nc –TiN nanocomposite coatings produced by a combined magnetron sputtering and ion implantation method. Surf. Coat.S Technol. 200(1–4), 744–747, ISSN O257-8972 (2005)CrossRefGoogle Scholar
  3. 3.
    Jaić, M., Živadin, R.: Površinska obrada drveta – svojstva materijala, kvalitet obrade. SITZAMS, Beograd, Srbija (1993)Google Scholar
  4. 4.
    Sanzarovski, A.T.: Metodi opredelenija mehaničeskih i adgezionih svoistv polimerih pokriti, Moskva (1974)Google Scholar
  5. 5.
    Volinsky, A.A., Moody, N.R., Gerberich, W.W.: Interfacial toughness measurements for thin films on substrates. Act Mater. 50(30), 441–466 (2002)CrossRefGoogle Scholar
  6. 6.
    Gerald Stoney, G.: The stress of metallic films deposited by electrolysis. In: Proceedings of the Royal Society of London. Series A, Containing Papers of a Mathematical and Physical Character, vol. 82, no. 553, pp. 172–175 (1999)Google Scholar
  7. 7.
    Vela, J.B., Adhihetty, I.S., Junker, K., Volinsky, A.A.: Mechanical Properties and fracture toughness of Organe – silicate Glass (OSG) low-k dielectric thim films for microelectronic application. Int. J. Fract. 119(4), 487–499 (2003)CrossRefGoogle Scholar

Copyright information

© Springer Nature Switzerland AG 2020

Authors and Affiliations

  • Esed Azemović
    • 1
  • Ibrahim Busuladžić
    • 1
    Email author
  • Izet Horman
    • 1
  1. 1.Faculty of Mechanical EngineeringUniversity of SarajevoSarajevoBosnia and Herzegovina

Personalised recommendations