Active Metal-Type Compounds

  • Leiva Casemiro OliveiraEmail author
  • Antonio Marcus Nogueira Lima
  • Carsten Thirstrup
  • Helmut Franz Neff
Part of the Springer Series in Surface Sciences book series (SSSUR, volume 70)


This chapter describe the operation points, i.e., the necessary parameters to excited the surface plasmon for the free electron type metals. Aspects like incident angle range, wavelength range, metal thickness, optical substrate, nanoparticle size, dynamic range, responsivity, SPR depth intensity and line broadening are present.


  1. 1.
    Erhart, P., Klein, A., Egdell, R.G., Albe, K.: Band structure of indium oxide: indirect versus direct gap. Phys. Rev. B 75, 153205 (2007)Google Scholar
  2. 2.
    Kerkache, L., Layadi, A., Mosser, A.: Effect of oxygen partial pressure on the structural and optical properties of DC sputtered ITO thin films. J. Alloy. Compd. 485, 46–50 (2009)Google Scholar
  3. 3.
    Rhodes, C., Franzen, S., Maria, J.P., Losego, M., Leonard, D.N., Laughlin, B., Duscher, G., Weibel, S.: Surface plasmon resonance in conducting metal oxides. J. Appl. Phys. 100, 054905 (2006)Google Scholar
  4. 4.
    Franzen, S., Rhodes, C., Cerruti, M., Gerber, R.W., Losego, M., Maria, J.P., Aspnes, D.E.: Plasmonic phenomena in indium tin oxide and ITO-Au hybrid films. Opt. Lett. 34(18), 2867–2869 (2009)Google Scholar
  5. 5.
    Roux, L., Hanus, J., Fracois, J.C., Sigrist, M.: The optical properties of titanium nitrides and carbides: spectral selectivity and photothermal conversion of solar energy. Sol. Energy Mater. 7, 299–312 (1982)Google Scholar
  6. 6.
    Allmaier, H., Chioncel, L., Arrigoni, E.: Titanium nitride: a correlated metal at the threshold of a Mott transition. Phys. Rev. B 79, 235126 (2009)Google Scholar
  7. 7.
    Meng, L.-J., Azevedo, A., dos Santos, M.P.: Deposition and properties of titanium nitride films produced by DC reactive magnetron sputtering. Vacuum 46, 233–239 (1995)Google Scholar

Copyright information

© Springer Nature Switzerland AG 2019

Authors and Affiliations

  • Leiva Casemiro Oliveira
    • 1
    Email author
  • Antonio Marcus Nogueira Lima
    • 2
  • Carsten Thirstrup
    • 3
  • Helmut Franz Neff
    • 2
  1. 1.Department of Computer Science (DC)Federal University of the Semi-Arid Region (UFERSA)MossoróBrazil
  2. 2.Department of Electrical Engineering (DEE)Federal University of Campina Grande (UFCG)Campina GrandeBrazil
  3. 3.Danish National Metrology InstituteKongens LyngbyDenmark

Personalised recommendations