Current-Induced Charges and Hydrogen Species Distributions in MOS Silicon Dioxide Films
The effect of low temperature incorporation of H2O and D2O on ultradry thermal silicon dioxide films has been studied using chemical analysis by secondary ion mass spectrometry and oxide capacitor current flow by avalanche injection of electrons from the silicon substrate. Hydrogen was transported from the metal interface to the silicon interface during current flow and diffused into the silicon to form electrically inactive complexes with boron donors. The presence of hydrogen near the silicon interface enhanced the production of traps at this interface during current flow. Also during current flow, electrons were captured by oxide defects containing hydrogen or deuterium impurities. The capture cross sections for defects involving the two isotopes differed by an order of magnitude.
KeywordsAreal Density Interface Trap Silicon Dioxide Film Interface Trap Density Deuterium Concentration
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