Real Time Spectroscopic Ellipsometry for Non-Invasive Characterization of Thin Film Growth and Etching

  • R. W. Collins
  • Ilsin An
  • Yue Cong
  • A. R. Heyd
  • H. S. Witham
  • R. Messier
  • K. Vedam

Abstract

Determination of material properties in real time during preparation or processing is an important problem in materials research. Many technologically relevant thin film materials are fabricated in adverse environments such as plasmas or reactive gases. In these situations, an optical probe is among the few non-invasive methods of real time characterization.

Keywords

Dielectric Function Unbiased Estimator Spectroscopic Ellipsometry Damage Layer Thin Film Growth 
These keywords were added by machine and not by the authors. This process is experimental and the keywords may be updated as the learning algorithm improves.

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Copyright information

© Springer Science+Business Media New York 1991

Authors and Affiliations

  • R. W. Collins
    • 1
  • Ilsin An
    • 1
  • Yue Cong
    • 1
  • A. R. Heyd
    • 1
  • H. S. Witham
    • 1
  • R. Messier
    • 1
  • K. Vedam
    • 1
  1. 1.Materials Research LaboratoryThe Pennsylvania State UniversityUniversity ParkUSA

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