Manufacturability

  • Srinivasan Sivaram

Abstract

This chapter is different from the rest of the book. It is not directly pertinent to the art or science of CVD; instead it deals with the development process. It provides a framework to increase the efficiency with which processes can be made manufacturable. I believe this framework should be a prerequisite for all process/equipment engineers who hope to work in the microelectronic industry.

Keywords

Chemical Vapor Deposition Control Chart Passivation Film Microelectronic Industry Step Coverage 
These keywords were added by machine and not by the authors. This process is experimental and the keywords may be updated as the learning algorithm improves.

Preview

Unable to display preview. Download preview PDF.

Unable to display preview. Download preview PDF.

References

  1. 1.
    Project Management“, Class Notes, Integrated Project Systems, Inc., 1070 6th Ave # 112, Belmont, CA 94002.Google Scholar
  2. 2.
    D. C. Montgomery, Design and Analysis of Experiments, John Wiley, New York, 1976.Google Scholar
  3. 3.
    G. E. P. Box, W. G. Hunter, and J. S. Hunter, Statistics for Experimentors, John Wiley, New York, 1978Google Scholar
  4. R. L. Plackett, and J. P. Burmen, Biometrika 33, 305–325 (1946).MathSciNetMATHCrossRefGoogle Scholar
  5. 4.
    W. J. Diamond, Practical Experimental Designs, Van Nostrand Reinhold, New York, 1981.Google Scholar
  6. 5.
    A. R. Alvarez, D. J. Walters, and M. Johnson, Solid State Technol. 26 (7), 127 (1983).Google Scholar
  7. 6.
    International Business Machines Corp., Process Control, Capability and Improve-ment, The Quality Institute, Southbury, Conn., 1984.Google Scholar
  8. 7.
    C. E. Morosanu, Thin Films by Chemical Vapor Deposition, Elsevier, Amsterdam, 1990.Google Scholar
  9. 8.
    W. Kern, and V. S. Ban, in Thin Film Processes (Vossen and Kern, Eds.), p. 258, Academic Press, New York, 1978.Google Scholar
  10. 9.
    R. Reif, XXX, in Handbook of Plasma Processing Technology (Rossnagel, Cuomo, and Westwood, Eds.), p. 260, Noyes, Park Ridge, N. J., 1990.Google Scholar
  11. 10.
    R. Solanki, C. A. Moore, and G. J. Collins, Solid State Technol. 28 (6), 220 (1985).Google Scholar
  12. 11.
    J. Peters, F. Gebhardt, and T. Hall, Solid State Technol. 23(9), 121 (1980).Google Scholar

Copyright information

© Springer Science+Business Media New York 1995

Authors and Affiliations

  • Srinivasan Sivaram

There are no affiliations available

Personalised recommendations