Abstract
In order to reduce short channel effects, a dual metal concept has been employed in MOSFETs. But to eliminate the problem of a gate tunneling dual material double gate (DMDG) MOSFET is not sufficient. Hence, to overcome gate tunneling oxide engineering technique has been employed in a DMDG MOSFET. In this paper, a doping-less dual material double gate (DL-DMDG) MOSFET has been analyzed using oxide engineering technique. To induce an n-type substrate in a doping-less MOSFET, charge plasma concept has been incorporated. Using 2D ATLAS simulator various analog/RF parameters have been investigated for this device with different oxide materials. The basic purpose of this paper is to improve analog/RF performance of the device and to increase immunity to SCEs.
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Gupta, A., Kumar, A., Rai, S., Tripathi, R. (2020). Impact of Oxide Engineering on Analog/RF Performance of Doping-Less DMDG MOSFET. In: Dutta, D., Kar, H., Kumar, C., Bhadauria, V. (eds) Advances in VLSI, Communication, and Signal Processing. Lecture Notes in Electrical Engineering, vol 587. Springer, Singapore. https://doi.org/10.1007/978-981-32-9775-3_50
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DOI: https://doi.org/10.1007/978-981-32-9775-3_50
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