Abstract
A 64 kbit (kb) one-transistor-type ferroelectric memory array and peripheral logic circuits were integrated and characterized. N-channel Pt/SrBi2Ta2O9/Hf–Al–O/Si ferroelectric-gate field-effect transistors (FeFETs) were used as the memory cells. The array was designed as a NAND flash memory, which had 32 blocks and 8 word lines × 256 bit lines per block. The bit-line and block selector logic circuits were represented by logic NOT and NAND units that were constructed by the complimentary structure of an n-channel FeFET and a p-channel FeFET. The erase, program, and nondestructive read operations were demonstrated for all blocks. The reading of the memory cells showed a clear separation of their erased and all “1”-programmed states. Threshold-voltage retention of one block showed no significant degradation after 2 days. To program arbitrary “1” and “0” patterns a single-cell self-boost program scheme was introduced that can reduce program-disturb and power dissipation, and in fact very low program-inhibit-bit-line voltage (≤1.0 V) was achieved. Using this scheme the memory cells were programmed in “1” and “0” checkered pattern, and two distinguishable threshold-voltage distributions of 1 block (2 k cells) could be read out.
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References
Y. Tarui, T. Hirai, K. Teramoto, H. Koike, and K. Nagashima: Appl. Surf. Sci. 113, 656 (1997).
J.F. Scott, Ferroelectric Memories (Springer, Berlin, 2000) Chap. 12, p. 175
S. Sakai, R. Ilangovan, IEEE Electron Device Lett. 25 369 (2004)
M. Okuyama, Y. Ishibashi (eds.), Ferroelectric Thin Films—Basic Properties and Device Physics for Memory Applications (Springer, Berlin, 2005) Part 4, p. 219
S. Sakai, Adv. Sci. Technol. 45, 2382 (2006)
H. Ishiwara, Curr. Appl. Phys. 9, S2 (2009)
S. Sakai, M. Takahashi, Materials 3, 4950 (2010)
T. Hatanaka, R. Yajima, T. Horiuchi, S. Wang, X. Zhang, M. Takahashi, S. Sakai, K. Takeuchi, IEEE J. Solid-State Circuits, 45, 2156 (2010)
T.S. Böscke, J. Müller, D. Bräuhaus, U. Schröder, U. Böttger, IEDM Tech. Dig. (2011), p. 547
S. Sakai, X. Zhang, L.V. Hai, W. Zhang, M. Takahashi, in Proceedings of the 12th IEEE Annual Non-volatile Memory Technology Symposium (2012), p. 55.
S. Sakai, US Patent 7,226,795 (2005)
S. Sakai, R. Ilangovan, M. Takahashi, Jpn. J. Appl. Phys. 43, 7876 (2004)
S. Sakai, M. Takahashi, R. Ilangovan, IEDM Tech. Dig., 915 (2004)
M. Takahashi, S. Sakai, Jpn. J. Appl. Phys. 44, L800 (2005)
Q.-H. Li, S. Sakai, Appl. Phys. Lett. 89, 222910 (2006)
T. Horiuchi, M. Takahashi, Q.-H. Li, S. Wang, S. Sakai, Semicond. Sci. Technol. 25, 055005 (2010)
Q.-H. Li, M. Takahashi, T. Horiuchi, S. Wang, S. Sakai, Semicond. Sci. Technol. 23, 045011 (2008)
Q.-H. Li, T. Horiuchi, S. Wang, M. Takahashi, S. Sakai, Semicond. Sci. Technol. 24, 025012 (2009)
M. Takahashi, T. Horiuchi, Q.-H. Li, S. Wang, K.-Y. Yun, S. Sakai, Electron. Lett. 44, 467 (2008)
M. Takahashi, S. Wang, T. Horiuchi, S. Sakai, IEICE Electron. Express 6, 831 (2009)
L.V. Hai, M. Takahashi, S. Sakai, Semicond. Sci. Technol. 25, 115013 (2010)
L.V. Hai, M. Takahashi, S. Sakai, in Proceedings of 3rd IEEE International Memory Workshop, 2011, p. 175.
L.V. Hai, M. Takahashi, W. Zhang, S. Sakai, Semicond. Sci. Technol. 30, 015024 (2015)
L.V. Hai, M. Takahashi, W. Zhang, S. Sakai, Jpn. J. Appl. Phys. 54, 088004 (2015)
S. Sakai, M. Takahashi, K. Takeuchi, Q.H. Li, T. Horiuchi, S. Wang, K.Y. Yun, M. Takamiya, T. Sakurai, in Proceedings of 23rd IEEE Non-volatile Semiconductor Memory Workshop: 3rd International Conference on Memory Technology and Design (2008), p. 103.
S. Wang, M. Takahashi, Q.-H. Li, K. Takeuchi, S. Sakai, Semicond. Sci. Technol. 24 105029 (2009)
K. Miyaji, S. Noda, T. Hatanaka, M. Takahashi, S. Sakai, K. Takeuchi, Solid-State Electron. 58, 34 (2011)
X.-Z. Zhang, K. Miyaji, M. Takahashi, K. Takeuchi, S. Sakai, in Proceedings of 3rd IEEE International Memory Workshop (2011), p. 155.
X. Zhang, M. Takahashi, S. Sakai, Integrated Ferroelectr. 132, 114 (2012)
X. Zhang, M. Takahashi, K. Takeuchi, S. Sakai, Jpn. J. Appl. Phys. 51, 04DD01 (2012)
K. Imamiya, H. Nakamura, T. Himeno, T. Yamamura, T. Ikehashi, K. Takeuchi, K. Kanda, K. Hosono, T. Futatsuyama, K. Kawai, R. Shirota, N. Arai, F. Arai, K. Hatakeyama, H. Hazama, M. Saito, H. Meguro, K. Conley, K. Quader, J.J. Chen, IEEE J. Solid-State Circuits 37, 1493 (2002)
International Technology Roadmap for Semiconductors 2007 Edition, Process Integration, Devices, and Structures. Table PIDS5a Non-volatile Memory Technology Requirements Near-term Years
S. Wang, M. Takahashi, S. Sakai, unpublished
X. Zhang, M. Takahashi, S. Sakai, unpublished
T. Tanaka, Y. Tanaka, H. Nakamura, K. Sakui, H. Oodaira, R. Shirota, K. Ohuchi, F. Masuoka, H. Hara, IEEE J. Solid-State Circuits 29, 1366 (1994)
M. Momodomi, T. Tanaka, Y. Iwata, Y. Tanaka, H. Oodaira, Y. Itoh, R. Shirota, K. Ohuchi, F. Masuoka, IEEE J. Solid-State Circuits 26 492 (1991)
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This work was partially supported by New Energy and Industrial Technology Development Organization.
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Sakai, S., Takahashi, M. (2020). Novel Application of FeFETs to NAND Flash Memory Circuits. In: Park, BE., Ishiwara, H., Okuyama, M., Sakai, S., Yoon, SM. (eds) Ferroelectric-Gate Field Effect Transistor Memories. Topics in Applied Physics, vol 131. Springer, Singapore. https://doi.org/10.1007/978-981-15-1212-4_16
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