Abiotic Stress Tolerance in Wheat and the Role of Silicon: An Experimental Evidence

Ahmed, Mukhtar; Qadeer, Ummara; Fayayz-ul-Hassan; Fahad, Shah; Naseem, Wajid; Duangpan, Saowapa; Ahmad, Shakeel

doi:10.1007/978-981-15-0025-1_22

Mukhtar Ahmed^2,3,4,
Ummara Qadeer²,
Fayayz-ul-Hassan²,
Shah Fahad⁵,
Wajid Naseem⁶,
Saowapa Duangpan⁷ &
…
Shakeel Ahmad⁸

805 Accesses
5 Citations

Abstract

Silicon (Si) has beneficial effect on crop growth and development under water stress condition. The study about the effect of silicon application on growth and water relation of wheat under water-limited conditions was carried out in pots at PMAS Arid Agriculture University, Rawalpindi, Pakistan. Seeds of two cultivars, i.e., NARC-2009 and Chakwal-50, were taken from the National Agricultural Research Center (NARC). In this experiment, as the source of silicon, silicic acid, sodium silicate, and silica gel were used in the silicon-applied treatments. The effect of silicic acid, sodium silicate, and silica gel at rate of 0.5%, 1.0%, and 1.5% solution was investigated for germination, physiological, and yield traits, and it was compared with control. Physiological parameters like leaf membrane stability index, epicuticular wax, crop growth rate, relative water content, stomatal conductance, transpiration rate, photosynthetic rate, leaf area, leaf area index, chlorophyll contents, leaf succulence, relative leaf water contents, silicon concentration in leaves, and proline contents were measured. The results depicted that different silicon rates and application levels have a significant impact upon crop growth and development. Wheat crop responded well to silicon priming treatments. Maximum grain yield was obtained for silica gel with 1.5% silicon application level, whereas minimum grain yield was obtained by control treatment. Similarly, genotypes responded significantly to silicon priming treatments for grain production. Cultivar NARC-2009 performed well under different silicon regime of the rainfed zone of pothwar, while cultivar Chakwal-50 gave less seed production. Silicon priming could be a good viable option in the future to cope abiotic stress.

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Authors and Affiliations

Department of Agronomy, Pir Mehr Ali Shah Arid Agriculture University, Rawalpindi, Pakistan
Mukhtar Ahmed, Ummara Qadeer & Fayayz-ul-Hassan
Department of Agricultural Research for Northern Sweden, Swedish University of Agricultural Sciences, Umeå, Sweden
Mukhtar Ahmed
Department of Biological Systems Engineering, Washington State University, Pullman, WA, USA
Mukhtar Ahmed
Department of Agriculture, University of Swabi, Swabi, Khyber Pakhtunkhwa (KPK), Pakistan
Shah Fahad
Department of Agronomy, University College of Agriculture & Environmental Sciences (UCA&ES), Islamia University of Bahawalpur, Bahawalpur, Punjab, Pakistan
Wajid Naseem
Department of Plant Science, Faculty of Natural Resources, Prince of Songkla University, Songkla, Thailand
Saowapa Duangpan
Department of Agronomy, Bahauddin Zakariya University, Multan, Pakistan
Shakeel Ahmad

Authors

Mukhtar Ahmed
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Ummara Qadeer
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Fayayz-ul-Hassan
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Shah Fahad
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Wajid Naseem
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Saowapa Duangpan
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Shakeel Ahmad
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Correspondence to Mukhtar Ahmed .

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Department of Agronomy, Faculty of Agriculture, Sher-e-Bangla Agricultural University, Dhaka, Bangladesh
Mirza Hasanuzzaman

Appendices

22.1.1 Appendix 22.1: Analysis of Variance for Silicon Concentration in Plants at Three-Leaf Stage Among two Wheat Cultivars for Different Silicon Chemicals and Different Application Levels

SoV	DF	SS	MS	F	P
Cultivar (C)	1	2.57E-04	2.57E-04	620.76	∗∗∗
Treatments (T)	3	0.0058	0.00193	4669.49	∗∗∗
Application level (L)	2	1.08E-05	5.39E-06	13	∗∗∗
C × T	3	6.15E-05	2.05E-05	49.46	∗∗∗
C × L	2	8.79E-07	4.40E-07	1.06	NS
T × L	6	1.57E-05	2.62E-06	6.32	∗∗∗
C × T × L	6	2.98E-06	4.96E-07	1.2	NS
Error	48	1.99E-05	4.14E-07
Total	71	0.00617
CV	3.97

∗∗∗p ≤ 0.001 and NS = Non-significant

22.1.2 Appendix 22.2: Analysis of Variance for Silicon Concentration in Plants at Anthesis Stage Among two Wheat Cultivars for Different Silicon Chemicals and Different Application Levels

SoV	DF	SS	MS	F	P
Cultivar (C)	1	1.13E-04	1.13E-04	78.13	∗∗∗
Treatments (T)	3	0.03835	0.01278	8818.93	∗∗∗
Application level (L)	2	1.03E-04	5.15E-05	35.5	∗∗∗
C × T	3	4.27E-05	1.42E-05	9.82	∗∗∗
C × L	2	8.58E-07	4.29E-07	0.3	NS
T × L	6	1.60E-04	2.66E-05	18.37	∗∗∗
C × T × L	6	3.34E-06	5.56E-07	0.38	NS
Error	48	6.96E-05	1.45E-06
Total	71	0.03884
CV	2.91

∗∗∗p ≤ 0.001 and NS = Non-significant

22.1.3 Appendix 22.3: Analysis of Variance for Silicon Concentration in Plants at Maturity Stage Among two Wheat Cultivars for Different Silicon Chemicals and Different Application Levels

SoV	DF	SS	MS	F	P
Cultivar (C)	1	2.31E-04	2.31E-04	78.13	∗∗∗
Treatments (T)	3	7.83E-02	2.61E-02	8818.93	∗∗∗
Application level (L)	2	2.10E-04	1.05E-04	35.5	∗∗∗
C × T	3	8.72E-05	2.91E-05	9.82	∗∗∗
C × L	2	1.75E-06	8.75E-07	0.3	NS
T × L	6	3.26E-04	5.44E-05	18.37	∗∗∗
C × T × L	6	6.81E-06	1.13E-06	0.38	NS
Error	48	1.42E-04	2.96E-06
Total	71	7.93E-02
CV	2.91

∗∗∗p ≤ 0.001 and NS = Non-significant

22.1.4 Appendix 22.4: Analysis of Variance for Photosynthetic Rate Among two Wheat Cultivars for Different Silicon Chemicals and Different Application Levels

SoV	DF	SS	MS	F	P
Cultivar (C)	1	40.95	40.951	5.08	∗∗
Application level (L)	2	18.81	9.403	1.17	NS
Treatment (T)	3	125.27	41.756	5.18	∗∗∗
G × L	2	67.33	33.665	4.17	∗∗
T × G	3	414.79	138.265	17.14	∗∗∗
L × T	6	64.19	10.698	1.33	NS
G × T × L	6	56.23	9.372	1.16	NS
Error	48	387.11	8.065
Total	71	1174.68
CV	12.02

∗∗p ≤ 0.01, ∗∗∗p ≤ 0.001, and NS = Non-significant

22.1.5 Appendix 22.5: Analysis of Variance for Transpiration Rate Among two Wheat Cultivars for Different Silicon Chemicals and Different Application Levels

SoV	DF	SS	MS	F	P
Cultivar (C)	1	41.299	41.2989	146.66	∗∗∗
Application level (L)	2	7.796	3.8982	13.84	∗∗∗
Treatment (T)	3	123.364	41.1212	146.02	∗∗∗
G × L	2	0.013	0.0066	0.02	NS
T × G	3	0.588	0.1961	0.7	NS
L × T	6	1.589	0.2648	0.94	NS
G × T × L	6	0.085	0.0141	0.05	NS
Error	48	13.517	0.2816
Total	71	188.251
CV	6.55

∗∗∗p ≤ 0.001 and NS = Non-significant

22.1.6 Appendix 22.6: Analysis of Variance for Stomatal Conductance Among two Wheat Cultivars for Different Silicon Chemicals and Different Application Levels

SoV	DF	SS	MS	F	P
Cultivar (C)	1	0.32	0.32	216.14	∗∗∗
Application level (L)	2	0.05202	0.02601	17.57	∗∗∗
Treatment (T)	3	0.87983	0.29328	198.09	∗∗∗
G × L	2	0.00068	0.00034	0.23	NS
T × G	3	0.00974	0.00325	2.19	NS
L × T	6	0.00736	0.00123	0.83	NS
G × T × L	6	0.00021	0.00004	0.02	NS
Error	48	0.07107	0.00148
Total	71	1.34091
CV	6.1

∗∗∗p ≤ 0.001 and NS = Non-significant

22.1.7 Appendix 22.7: Analysis of Variance for Stomatal Resistance Among two Wheat Cultivars for Different Silicon Chemicals and Different Application Levels

SoV	DF	SS	MS	F	P
Cultivar (C)	1	0.005	0.005	0.05	NS
Application level (L)	2	0.50083	0.25042	2.46	∗
Treatment (T)	3	0.75278	0.25093	2.47	∗
G × L	2	1.08583	0.54292	5.34	∗∗∗
T × G	3	0.34833	0.11611	1.14	NS
L × T	6	0.68139	0.11356	1.12	NS
G × T × L	6	0.50083	0.08347	0.82	NS
Error	48	4.88	0.10167
Total	71	8.755
CV	49.69

∗p ≤ 0.05, ∗∗∗p ≤ 0.001, and NS = Non-significant

22.1.8 Appendix 22.8: Analysis of Variance for Chlorophyll Contents Among two Wheat Cultivars for Different Silicon Chemicals and Different Application Levels

SoV	DF	SS	MS	F	P
Cultivar (C)	1	350.46	350.463	326.22	∗∗∗
Application level (L)	2	106.22	53.1093	49.44	∗∗∗
Treatment (T)	3	3030.77	1010.26	940.38	∗∗∗
C × L	2	0.24	0.12043	0.11	NS
T × C	3	6.87	2.29083	2.13	NS
L × T	6	8.91	1.48531	1.38	NS
C × T × L	6	0.02	0.00337	0	NS
Error	48	51.57	1.07431
Total	71	3555.07
CV	2.24

∗∗∗p ≤ 0.001 and NS = Non-significant

22.1.9 Appendix 22.9: Analysis of Variance for Drought-Resistant Index Among two Wheat Cultivars for Different Silicon Chemicals and Different Application Levels

SoV	DF	SS	MS	F	P
Application level (L)	2	0.00262	0.00131	6.1	∗∗∗
Treatments (T)	3	0.0864	0.0288	134.14	∗∗∗
Cultivar (C)	1	0.12083	0.12083	562.76	∗∗∗
T × L	6	0.00112	1.87E-04	0.87	NS
C × L	2	9.93E-06	4.97E-06	0.02	NS
C × T	3	3.28E-04	1.09E-04	0.51	NS
C × T × L	6	4.26E-06	7.10E-07	0	NS
Error	48	0.01031	2.15E-04
Total	71	0.22161
CV	3.05

∗∗∗p ≤ 0.001 and NS = Non-significant

22.1.10 Appendix 22.10: Analysis of Variance for Epicuticular Wax Among two Wheat Cultivars for Different Silicon Chemicals and Different Application Levels

SoV	DF	SS	MS	F	P
Application level (L)	2	0.5548	0.2774	0.49	NS
Treatments (T)	3	18.3074	6.1025	10.75	∗∗∗
Cultivar (C)	1	44.2765	44.2765	77.99	∗∗∗
T × L	6	0.2378	0.0396	0.07	NS
C × L	2	0.0044	0.0022	0	NS
C × T	3	0.1446	0.0482	0.08	NS
C × T × L	6	0.0019	0.0003	0	NS
Error	48	27.2494	0.5677
Total	71	90.7767
CV	10.78

∗∗∗p ≤ 0.001 and NS = Non-significant

22.1.11 Appendix 22.11: Analysis of Variance for Relative Water Content Among two Wheat Cultivars for Different Silicon Chemicals and Different Application Levels

SoV	DF	SS	MS	F	P
Application level (L)	2	28.65	14.3247	1.76	NS
Treatments (T)	3	945.43	315.143	38.71	∗∗∗
Cultivar (C)	1	1166.94	1166.94	143.32	∗∗∗
T × L	6	12.28	2.04638	0.25	NS
C × L	2	0.07	0.03454	0	NS
C × T	3	2.28	0.75989	0.09	NS
C × T × L	6	0.03	0.00493	0	NS
Error	48	390.82	8.14209
Total	71	2546.5
CV	3.6

∗∗∗p ≤ 0.001 and NS = Non-significant

22.1.12 Appendix 22.12: Analysis of Variance for Leaf Succulence Among two Wheat Cultivars for Different Silicon Chemicals and Different Application Levels

SoV	DF	SS	MS	F	P
Application level (L)	2	2.173	1.087	0.44	NS
Treatments (T)	3	71.714	23.905	9.57	∗∗∗
Cultivar (C)	1	181.341	181.341	72.62	∗∗∗
T × L	6	0.931	0.155	0.06	NS
C × L	2	0.018	0.009	0	NS
C × T	3	0.599	0.2	0.08	NS
C × T × L	6	0.008	0.001	0	NS
Error	48	119.863	2.497
Total	71	376.647
CV	11.42

∗∗∗p ≤ 0.001 and NS = Non-significant

22.1.13 Appendix 22.13: Analysis of Variance for Leaf Membrane Stability Index Among two Wheat Cultivars for Different Silicon Chemicals and Different Application Levels

SoV	DF	SS	MS	F	P
Application level (L)	2	28.65	14.325	1.15	NS
Treatments (T)	3	945.43	315.143	25.37	∗∗∗
Cultivar (C)	1	955.29	955.293	76.91	∗∗∗
T × L	6	12.28	2.046	0.16	NS
C × L	2	0.07	0.035	0	NS
C × T	3	2.28	0.76	0.06	NS
C × T × L	6	0.03	0.005	0	NS
Error	48	596.24	12.422
Total	71	2540.27
CV	4.75

∗∗∗p ≤ 0.001 and NS = Non-significant

22.1.14 Appendix 22.14: Analysis of Variance for Proline Content Among two Wheat Cultivars for Different Silicon Chemicals and Different Application Levels

SoV	DF	SS	MS	F	P
Application level (L)	2	28.65	14.325	6.25	∗∗∗
Treatments (T)	3	945.43	315.143	137.4	∗∗∗
Cultivar (C)	1	955.29	955.293	416.5	∗∗∗
T × L	6	12.28	2.046	0.89	NS
C × L	2	0.07	0.035	0.02	NS
C × T	3	2.28	0.76	0.33	NS
C × T × L	6	0.03	0.005	0	NS
Error	48	110.09	2.294
Total	71	2054.12
CV	3.02

∗∗∗p ≤ 0.001 and NS = Non-significant

22.1.15 Appendix 22.15: Analysis of Variance for Plant Height Among two Wheat Cultivars for Different Silicon Chemicals and Different Application Levels

SoV	DF	SS	MS	F	P
Application level (L)	2	28.65	14.3247	1.23	NS
Treatments (T)	3	945.43	315.143	26.96	∗∗∗
Cultivar (C)	1	1700.04	1700.04	145.44	∗∗∗
T × L	6	12.28	2.04638	0.18	NS
C × L	2	0.07	0.03454	0	NS
C × T	3	2.28	0.75989	0.07	NS
C × T × L	6	0.03	0.00493	0	NS
Error	48	561.08	11.6891
Total	71	3249.86
CV	4.26

∗∗∗p ≤ 0.001 and NS = Non-significant

22.1.16 Appendix 22.16: Analysis of Variance for Grain Per Spike Among two Wheat Cultivars for Different Silicon Chemicals and Different Application Levels

SoV	DF	SS	MS	F	P
Application level (L)	2	31.3	15.652	6.57	∗∗∗
Treatments (T)	3	987.4	329.133	138.07	∗∗∗
Cultivar (C)	1	945.91	945.909	396.82	∗∗∗
T × L	6	13.42	2.236	0.94	NS
C × L	2	0.08	0.038	0.02	NS
C × T	3	1.01	0.338	0.14	NS
C × T × L	6	0.03	0.005	0	NS
Error	48	114.42	2.384
Total	71	2093.57
CV	3.66

∗∗∗p ≤ 0.001 and NS = Non-significant

22.1.17 Appendix 22.17: Analysis of Variance for Spike Length Among two Wheat Cultivars for Different Silicon Chemicals and Different Application Levels

SoV	DF	SS	MS	F	P
Application level (L)	2	3.478	1.739	6.57	∗∗∗
Treatments (T)	3	109.711	36.57	138.07	∗∗∗
Cultivar (C)	1	105.101	105.101	396.82	∗∗∗
T × L	6	1.491	0.248	0.94	NS
C × L	2	0.008	0.004	0.02	NS
C × T	3	0.113	0.038	0.14	NS
C × T × L	6	0.004	0.001	0	NS
Error	48	12.713	0.265
Total	71	232.619
CV	3.66

∗∗∗p ≤ 0.001 and NS = Non-significant

22.1.18 Appendix 22.18: Analysis of Variance for Spikelet Per Spike Among two Wheat Cultivars for Different Silicon Chemicals and Different Application Levels

SoV	DF	SS	MS	F	P
Application level (L)	2	3.478	1.739	6.57	∗∗∗
Treatments (T)	3	109.711	36.57	138.07	∗∗∗
Cultivar (C)	1	105.101	105.101	396.82	∗∗∗
T × L	6	1.491	0.248	0.94	NS
C × L	2	0.008	0.004	0.02	NS
C × T	3	0.113	0.038	0.14	NS
C × T × L	6	0.004	0.001	0	NS
Error	48	12.713	0.265
Total	71	232.619
CV	3.16

∗∗∗p ≤ 0.001 and NS = Non-significant

22.1.19 Appendix 22.19: Analysis of Variance for Hundred Grain Weight Among two Wheat Cultivars for Different Silicon Chemicals and Different Application Levels

SoV	DF	SS	MS	F	P
Application level (L)	2	0.35622	0.17811	7.64	∗∗∗
Treatments (T)	3	13.8041	4.60137	197.32	∗∗∗
Cultivar (C)	1	18	18	771.89	∗∗∗
T × L	6	0.06434	0.01072	0.46	NS
C × L	2	1.58E-31	7.90E-32	0	NS
C × T	3	7.41E-31	2.47E-31	0	NS
C × T × L	6	2.57E-31	4.29E-32	0	NS
Error	48	1.11932	0.02332
Total	71	33.344
CV	3.92

∗∗∗p ≤ 0.001 and NS = Non-significant

22.1.20 Appendix 22.20: Analysis of Variance for Biological Yield Among two Wheat Cultivars for Different Silicon Chemicals and Different Application Levels

SoV	DF	SS	MS	F	P
Cultivar (C)	1	2,321,931	2,321,931	17.61	∗∗∗
Treatment (T)	3	2.48E+08	8.25E+07	625.76	∗∗∗
Application level (L)	2	1.44E+07	7,199,275	54.6	∗∗∗
T × C	3	59000.3	19666.8	0.15	NS
C × L	2	4844.28	2422.14	0.02	NS
L × T	6	9,146,901	1,524,483	11.56	∗∗∗
C × T × L	6	797.112	132.852	0	NS
Error	48	6,328,712	131,848
Total	71	2.80E+08
CV	3.01

∗∗∗p ≤ 0.001 and NS = Non-significant

22.1.21 Appendix 22.21: Analysis of Variance for Grain Yield Among two Wheat Cultivars for Different Silicon Chemicals and Different Application Levels

SoV	DF	SS	MS	F	P
Cultivar (C)	1	2.12E+07	2.12E+07	131.53	∗∗∗
Treatment (T)	3	4,541,380	1,513,793	9.38	∗∗∗
Application level (L)	2	5,333,167	2,666,584	16.52	∗∗∗
T × C	3	166,185	55,395	0.34	NS
C × L	2	195,159	97579.6	0.6	NS
L × T	6	1,584,736	264,123	1.64	NS
C × T × L	6	57,991	9665.17	0.06	NS
Error	48	7,745,683	161,368
Total	71	4.09E+07
CV	14.15

∗∗∗p ≤ 0.001 and NS = Non-significant

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Ahmed, M. et al. (2020). Abiotic Stress Tolerance in Wheat and the Role of Silicon: An Experimental Evidence. In: Hasanuzzaman, M. (eds) Agronomic Crops. Springer, Singapore. https://doi.org/10.1007/978-981-15-0025-1_22

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DOI: https://doi.org/10.1007/978-981-15-0025-1_22
Published: 10 March 2020
Publisher Name: Springer, Singapore
Print ISBN: 978-981-15-0024-4
Online ISBN: 978-981-15-0025-1
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Abiotic Stress Tolerance in Wheat and the Role of Silicon: An Experimental Evidence

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Appendices

Appendices

22.1.1 Appendix 22.1: Analysis of Variance for Silicon Concentration in Plants at Three-Leaf Stage Among two Wheat Cultivars for Different Silicon Chemicals and Different Application Levels

22.1.2 Appendix 22.2: Analysis of Variance for Silicon Concentration in Plants at Anthesis Stage Among two Wheat Cultivars for Different Silicon Chemicals and Different Application Levels

22.1.3 Appendix 22.3: Analysis of Variance for Silicon Concentration in Plants at Maturity Stage Among two Wheat Cultivars for Different Silicon Chemicals and Different Application Levels

22.1.4 Appendix 22.4: Analysis of Variance for Photosynthetic Rate Among two Wheat Cultivars for Different Silicon Chemicals and Different Application Levels

22.1.5 Appendix 22.5: Analysis of Variance for Transpiration Rate Among two Wheat Cultivars for Different Silicon Chemicals and Different Application Levels

22.1.6 Appendix 22.6: Analysis of Variance for Stomatal Conductance Among two Wheat Cultivars for Different Silicon Chemicals and Different Application Levels

22.1.7 Appendix 22.7: Analysis of Variance for Stomatal Resistance Among two Wheat Cultivars for Different Silicon Chemicals and Different Application Levels

22.1.8 Appendix 22.8: Analysis of Variance for Chlorophyll Contents Among two Wheat Cultivars for Different Silicon Chemicals and Different Application Levels

22.1.9 Appendix 22.9: Analysis of Variance for Drought-Resistant Index Among two Wheat Cultivars for Different Silicon Chemicals and Different Application Levels

22.1.10 Appendix 22.10: Analysis of Variance for Epicuticular Wax Among two Wheat Cultivars for Different Silicon Chemicals and Different Application Levels

22.1.11 Appendix 22.11: Analysis of Variance for Relative Water Content Among two Wheat Cultivars for Different Silicon Chemicals and Different Application Levels

22.1.12 Appendix 22.12: Analysis of Variance for Leaf Succulence Among two Wheat Cultivars for Different Silicon Chemicals and Different Application Levels

22.1.13 Appendix 22.13: Analysis of Variance for Leaf Membrane Stability Index Among two Wheat Cultivars for Different Silicon Chemicals and Different Application Levels

22.1.14 Appendix 22.14: Analysis of Variance for Proline Content Among two Wheat Cultivars for Different Silicon Chemicals and Different Application Levels

22.1.15 Appendix 22.15: Analysis of Variance for Plant Height Among two Wheat Cultivars for Different Silicon Chemicals and Different Application Levels

22.1.16 Appendix 22.16: Analysis of Variance for Grain Per Spike Among two Wheat Cultivars for Different Silicon Chemicals and Different Application Levels

22.1.17 Appendix 22.17: Analysis of Variance for Spike Length Among two Wheat Cultivars for Different Silicon Chemicals and Different Application Levels

22.1.18 Appendix 22.18: Analysis of Variance for Spikelet Per Spike Among two Wheat Cultivars for Different Silicon Chemicals and Different Application Levels

22.1.19 Appendix 22.19: Analysis of Variance for Hundred Grain Weight Among two Wheat Cultivars for Different Silicon Chemicals and Different Application Levels

22.1.20 Appendix 22.20: Analysis of Variance for Biological Yield Among two Wheat Cultivars for Different Silicon Chemicals and Different Application Levels

22.1.21 Appendix 22.21: Analysis of Variance for Grain Yield Among two Wheat Cultivars for Different Silicon Chemicals and Different Application Levels

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