Abstract
We have investigated different approaches to effectively one dimensional III-V semiconductor structures (quantum wires) with dimensionality dependent optical properties. The quantum wires are defined by high resolution electron-beam. lithography. By dry etching or selective implantation induced interdiffusion the patterns are transferred into the semiconductor material. The nanometer structures are analyzed by photoluminescence spectroscopy. In etched GaAs/GaAlAs wires we observe a strong decay of the quantum efficiency as the lateral width is reduced. This can be related to the high surface recombination velocity and surface depletion in GaAs. In InGaAs/ InP quantum wires, in contrast, the quantum efficiency is only weakly affected by surface effects. Using implantation induced interdiffusion we have defined buried quantum wire structures in GaAs/Ga.A1As. The photoluminescence spectra show clear lateral quantization effects.
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Forchel, A., Maile, B.E., Leier, H., Germann, R. (1988). Fabrication and Optical Characterization of Semiconductor Quantum Wires. In: Heinrich, H., Bauer, G., Kuchar, F. (eds) Physics and Technology of Submicron Structures. Springer Series in Solid-State Sciences, vol 83. Springer, Berlin, Heidelberg. https://doi.org/10.1007/978-3-642-83431-8_3
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DOI: https://doi.org/10.1007/978-3-642-83431-8_3
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