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Polaritons in Semiconductor Layer Structures

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Infrared Ellipsometry on Semiconductor Layer Structures

Part of the book series: Springer Tracts in Modern Physics ((STMP,volume 209))

Abstract

The infrared optical response of layered structures composed of polar semiconductor materials is strongly influenced by resonant excitation of phononand plasmon-supported bulk polaritons. In addition, subtle effects are caused by interface modes (surface polaritons, surface guided waves) at which electromagnetic radiation is mediated parallel to the interfaces of thin-film structures. Precise information on phonon and plasmon mode parameters can be obtained from measurement and model analysis of the frequency-dependent sample response, e.g., in terms of the complex ratio ρ in (2.1).1 A rich variety of plasmon-phonon supported bulk and interface modes can occur in thin-film structures composed of polar semiconductors, as will be shown here. A brief outline of the concept of bulk and interface polaritons is given in the following section. The occurrence of surface polaritons and surface guided waves in polar semiconductor thin-film structures is explained and demonstrated.

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Schubert, M. Polaritons in Semiconductor Layer Structures. In: Infrared Ellipsometry on Semiconductor Layer Structures. Springer Tracts in Modern Physics, vol 209. Springer, Berlin, Heidelberg. https://doi.org/10.1007/978-3-540-44701-6_4

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  • DOI: https://doi.org/10.1007/978-3-540-44701-6_4

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  • Publisher Name: Springer, Berlin, Heidelberg

  • Print ISBN: 978-3-540-23249-0

  • Online ISBN: 978-3-540-44701-6

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