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Scaling of Silicon PIN Waveguide Photodetector at 1550 nm Wavelength

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The Physics of Semiconductor Devices (IWPSD 2017)

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Abstract

Single-mode silicon p-i-n waveguides with varying cross-sections have been studied experimentally for on-chip photodetection at an operating wavelength λ ~ 1550 nm. It has been shown that the quantum efficiency increases with decreasing waveguide cross-section. The performance of such a photodetector can be modelled in terms of density of surface states, bulk two photon absorption co-efficient, and waveguide loss parameters.

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References

  1. M.W. Geis et al., CMOS-compatible all-Si high-speed waveguide photodiodes with high responsivity in near-infrared communication band. IEEE Photonics Technol. Lett. 19(3), 152–154 (2007)

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  2. Y. Li et al., Characterization of surface-state absorption in foundry-fabricated silicon ridge waveguides at 1550 nm using photocurrents, in Conference on Lasers and Electro-Optics. Optical Society of America (2016), p. SM2G.4

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Correspondence to Sreevatsa Kurudi .

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Kurudi, S., Nandi, R., Das, B.K. (2019). Scaling of Silicon PIN Waveguide Photodetector at 1550 nm Wavelength. In: Sharma, R., Rawal, D. (eds) The Physics of Semiconductor Devices. IWPSD 2017. Springer Proceedings in Physics, vol 215. Springer, Cham. https://doi.org/10.1007/978-3-319-97604-4_150

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