Abstract
The advent of FinFETs has extended the CMOS lifeline by a few more technology nodes (5 nm and even 3 nm are now under development), so it is critical for digital circuit designers and researchers to understand some of the fundamental differences between advanced FinFET nodes and older planar devices, along with the associated challenges (e.g., design and aging challenges) in the forthcoming sub-10 nm regime. This chapter consists of two major thrusts. In the first thrust, we present a comprehensive study that compares multiple technology nodes spanning from old planar devices to the most advanced FinFET nodes. This study adds to the FinFET design knowledge base and helps designers gain a thorough understanding of various design challenges. The second trust mainly looks at the impact of FinFET aging within the context of Internet of Things (IoT). Through extensive simulations with foundry-provided FinFET aging models, we conclude that aging can severely affect certain category of IoT applications; hence, this aspect needs to be incorporated in the design cycle to meet the overall system lifetime targets. Several candidate techniques against aging are also presented for designing robust IoT chips that perform faster, consume lower power, and last longer than without the use of these techniques.
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Notes
- 1.
This chapter focuses mostly on transistor aging (especially BTI and HCI). Battery aging, socket (and holder solder) aging in IoT devices are also important, but they are beyond the scope of our discussion.
- 2.
In advanced technology nodes the “numbering” scheme is somewhat “fuzzy”; while in older technologies the node “number” used to denote the smallest feature size—usually the transistor gate length, in modern technologies the node number does not refer to any one feature in the process, and foundries use slightly different conventions. In this chapter, we use 1× to denote the 14–16 nm FinFET nodes offered by several foundries.
- 3.
Here PDN refers to the pull down network, in the rest of book, PDN stands for power delivery network.
- 4.
This book focuses on circuit aging. Battery aging and socket (and holder solder) aging are out of the scope of discussion.
References
Gordon E Moore. Cramming more components onto integrated circuits. Proceedings of the IEEE, 86(1):82–85, 1998.
Paolo Madoglio, Hongtao Xu, Kailash Chandrashekar, Luis Cuellar, Muhammad Faisal, William Yee Li, Hyung Seok Kim, Khoa Minh Nguyen, Yulin Tan, Brent Carlton, et al. A 2.4 GHz WLAN digital polar transmitter with synthesized digital-to-time converter in 14nm trigate/FinFET technology for IoT and wearable applications. In Solid-State Circuits Conference (ISSCC), 2017 IEEE International, pages 226–227. IEEE, 2017.
Debajit Bhattacharya and Niraj K Jha. FinFETs: From Devices to Architectures. Advances in Electronics, 2014, 2014.
Benton H Calhoun, Yu Cao, Xin Li, Ken Mai, Lawrence T Pileggi, Rob A Rutenbar, and Kenneth L Shepard. Digital Circuit Design Challenges and Opportunities in the Era of Nanoscale CMOS. Proceedings of the IEEE, 96(2):343–365, 2008.
James Warnock. Circuit Design Challenges at the 14nm Technology Node. In Proceedings of the 48th Design Automation Conference, pages 464–467. ACM, 2011.
Robert Aitken, Greg Yeric, Brian Cline, Saurabh Sinha, Lucian Shifren, Imran Iqbal, and Vikas Chandra. Physical Design and FinFETs. In Proceedings of the 2014 on International symposium on physical design, pages 65–68. ACM, 2014.
Jong-Ho Lee. Bulk FinFETs: Design at 14 nm Node and Key Characteristics. In Nano Devices and Circuit Techniques for Low-Energy Applications and Energy Harvesting, pages 33–64. Springer, 2016.
Bin Yu, Leland Chang, Shibly Ahmed, Haihong Wang, Scott Bell, Chih-Yuh Yang, Cyrus Tabery, Chau Ho, Qi Xiang, Tsu-Jae King, et al. FinFET Scaling to 10 nm Gate Length. In Electron Devices Meeting, 2002. IEDM’02. International, pages 251–254. IEEE, 2002.
Jamil Kawa. Designing with FinFETs: The Opportunities and the Challenges. In Synopsys White Paper, pages 1–8. Synopsys, 2012.
Lawrence T Clark, Vinay Vashishtha, Lucian Shifren, Aditya Gujja, Saurabh Sinha, Brian Cline, Chandarasekaran Ramamurthy, and Greg Yeric. ASAP7: A 7-nm FinFET Predictive Process Design Kit. Microelectronics Journal, 53:105–115, 2016.
Prateek Mishra, Anish Muttreja, and Niraj K Jha. FinFET Circuit Design. In Nanoelectronic Circuit Design, pages 23–54. Springer, 2011.
Anish Muttreja, Niket Agarwal, and Niraj K Jha. CMOS Logic Design with Independent-gate FinFETs. In Computer Design, 2007. ICCD 2007. 25th International Conference on, pages 560–567. IEEE, 2007.
Farhana Sheikh and Vidya Varadarajan. The Impact of Device-width Quantization on Digital Circuit Design Using FinFET Structures. Proc. EE241 Spring, 1, 2004.
Jie Gu, John Keane, Sachin Sapatnekar, and Chris Kim. Width Quantization Aware FinFET Circuit Design. In Custom Integrated Circuits Conference, 2006. CICC’06. IEEE, pages 337–340. IEEE, 2006.
Wen-Kuan Yeh, Wenqi Zhang, Yi-Lin Yang, An-Ni Dai, Kehuey Wu, Tung-Huan Chou, Cheng-Li Lin, Kwang-Jow Gan, Chia-Hung Shih, and Po-Ying Chen. The Observation of Width Quantization Impact on Device Performance and Reliability for High-k/Metal Tri-Gate FinFET. IEEE Transactions on Device and Materials Reliability, 16(4):610–616, 2016.
Brian Swahn and Soha Hassoun. Gate Sizing: FinFETs vs 32nm Bulk MOSFETs. In Design Automation Conference, 2006 43rd ACM/IEEE, pages 528–531. IEEE, 2006.
Tsung-Lin Lee, Chih Chieh Yeh, Chang-Yun Chang, and Feng Yuan. FinFETs With Different Fin Heights, August 23 2016. US Patent 9,425,102.
Chi-Hung Lin, Chia-Shiang Chen, Yu-He Chang, Yu-Ting Zhang, Shang-Rong Fang, Santanu Santra, and Rung-Bin Lin. Design Space Exploration of FinFETs with Double Fin Heights for Standard Cell Library. In VLSI (ISVLSI), 2016 IEEE Computer Society Annual Symposium on, pages 673–678. IEEE, 2016.
Re-Engineering The FinFET:. http://semiengineering.com/re-engineering-the-finfet/.
Huajie Zhou, Yi Song, Qiuxia Xu, Yongliang Li, and Huaxiang Yin. Fabrication of Bulk-Si FinFET Using CMOS Compatible Process. Microelectronic Engineering, 94:26–28, 2012.
M-S Kim, Tom Vandeweyer, Efrain Altamirano-Sanchez, Harold Dekkers, Els Van Besien, Diana Tsvetanova, Olivier Richard, S Chew, Guillaume Boccardi, and Naoto Horiguchi. Self-aligned double patterning of 1× nm finfets; a new device integration through the challenging geometry. In Ultimate Integration on Silicon (ULIS), 2013 14th International Conference on, pages 101–104. IEEE, 2013.
FinFET, Multi-Patterning Aware Place, and Route Implementation:. http://go.mentor.com/4h_c2.
Mastering the Magic of Multi-Patterning:. http://go.mentor.com/4gue4.
Yongxun Liu, Kenichi Ishii, Meishoku Masahara, Toshiyuki Tsutsumi, Hidenori Takashima, Hiromi Yamauchi, and Eiichi Suzuki. Cross-sectional Channel Shape Dependence of Short-channel Effects in Fin-type Double-gate Metal Oxide Semiconductor Field-effect Transistors. Japanese journal of applied physics, 43(4S):2151, 2004.
W. P. Maszara and M. R. Lin. FinFETs - Technology and Circuit Design Challenges. In 2013 Proceedings of the ESSCIRC (ESSCIRC), pages 3–8, Sept 2013.
Brad D Gaynor and Soha Hassoun. Fin Shape Impact on FinFET Leakage with Application to Multithreshold and Ultralow-leakage FinFET design. IEEE Transactions on Electron Devices, 61(8):2738–2744, 2014.
Andy Biddle and Jason ST Chen. FinFET Technology-Understanding and Productizing a New Transistor. A joint whitepaper from TSMC and Synopsys, 2013.
M Rashed, N Jain, J Kim, M Tarabbia, I Rahim, S Ahmed, Je Kim, I Lin, S Chan, H Yoshida, et al. Innovations in Special Constructs for Standard Cell Libraries in Sub 28nm Technologies. In Electron Devices Meeting (IEDM), 2013 IEEE International, pages 9–7. IEEE, 2013.
Chi-Shuen Lee, Brian Cline, Saurabh Sinha, Greg Yeric, and H-S Philip Wong. 32-bit Processor Core at 5-nm Technology: Analysis of Transistor and Interconnect Impact on VLSI System Performance. In Electron Devices Meeting (IEDM), 2016 IEEE International, pages 28–3. IEEE, 2016.
FreePDK45 from NCSU:. https://www.eda.ncsu.edu/wiki/FreePDK45:Contents.
Silvestre Salas Rodriguez, Julio C Tinoco, Andrea G Martinez-Lopez, Joaquín Alvarado, and Jean-Pierre Raskin. Parasitic Gate Capacitance Model for Triple-gate FinFETs. IEEE Transactions on Electron Devices, 60(11):3710–3717, 2013.
Ning Lu, Terence B Hook, Jeffrey B Johnson, Carl Wermer, Christopher Putnam, and Richard A Wachnik. Efficient and Accurate Schematic Transistor Model of FinFET Parasitic Elements. IEEE Electron Device Letters, 34(9):1100–1102, 2013.
C Calvin Hu. Modern Semiconductor Devices for Integrated Circuits. Part 7: MOSFETs in ICs – Scaling, Leakage, and Other Topics, 2011.
Pablo Royer, Paul Zuber, Binjie Cheng, Asen Asenov, and Marisa Lopez-Vallejo. Circuit-level Modeling of FinFET Sub-threshold Slope and DIBL Mismatch Beyond 22nm. In Simulation of Semiconductor Processes and Devices (SISPAD), 2013 International Conference on, pages 204–207. IEEE, 2013.
Pranita Kerber, Qintao Zhang, Siyuranga Koswatta, and Andres Bryant. GIDL in Doped and Undoped FinFET Devices for Low-leakage Applications. IEEE Electron Device Letters, 34(1):6–8, 2013.
Seongjae Cho, Jung Hoon Lee, Shinichi O’uchi, Kazuhiko Endo, Meishoku Masahara, and Byung-Gook Park. Design of SOI FinFET on 32nm Technology Node for Low Standby Power (LSTP) Operation Considering Gate-induced Drain Leakage (GIDL). Solid-State Electronics, 54(10):1060–1065, 2010.
Thomas Chiarella, Liesbeth Witters, Abdelkarim Mercha, Christoph Kerner, Michal Rakowski, Claude Ortolland, L-Å Ragnarsson, Bertrand Parvais, Ari De Keersgieter, Stefan Kubicek, et al. Benchmarking SOI and Bulk FinFET Alternatives for PLANAR CMOS Scaling Succession. Solid-State Electronics, 54(9):855–860, 2010.
Neil HE Weste and David Money Harris. CMOS VLSI Design: A Circuits and Systems Perspective. Pearson Addison-Wesley, 2005.
Takayasu Sakurai and A Richard Newton. Alpha-Power Law MOSFET Model and its Applications to CMOS Inverter Delay and Other Formulas. IEEE Journal of Solid-State Circuits, 25(2):584–594, 1990.
James W Tschanz, James T Kao, Siva G Narendra, Raj Nair, Dimitri A Antoniadis, Anantha P Chandrakasan, and Vivek De. Adaptive Body Bias for Reducing Impacts of Die-to-die and Within-die Parameter Variations on Microprocessor Frequency and Leakage. IEEE Journal of Solid-State Circuits, 37(11):1396–1402, 2002.
Wen-Teng Chang, Shih-Wei Lin, Cheng-Ting Shih, and Wen-Kuan Yeh. Back Bias Modulation of UTBB FDSOI, Bulk FinFET, and SOI FinFET. In Nanoelectronics Conference (INEC), 2016 IEEE International, pages 1–2. IEEE, 2016.
D. Burnett, S. Parihar, H. Ramamurthy, and S. Balasubramanian. Finfet sram design challenges. In 2014 IEEE International Conference on IC Design Technology, pages 1–4, May 2014.
Witek P Maszara. Finfets: Designing for new logic technology. In Micro-and Nanoelectronics: Emerging Device Challenges and Solutions, pages 113–136. CRC Press, 2014.
B. Zimmer, S. O. Toh, H. Vo, Y. Lee, O. Thomas, K. Asanovic, and B. Nikolic. Sram assist techniques for operation in a wide voltage range in 28-nm cmos. IEEE Transactions on Circuits and Systems II: Express Briefs, 59(12):853–857, Dec 2012.
T. Song, W. Rim, S. Park, Y. Kim, G. Yang, H. Kim, S. Baek, J. Jung, B. Kwon, S. Cho, H. Jung, Y. Choo, and J. Choi. A 10 nm finfet 128 mb sram with assist adjustment system for power, performance, and area optimization. IEEE Journal of Solid-State Circuits, 52(1):240–249, Jan 2017.
Woojoo Lee, Yanzhi Wang, Tiansong Cui, Shahin Nazarian, and Massoud Pedram. Dynamic Thermal Management for FinFET-based Circuits Exploiting the Temperature Effect Inversion Phenomenon. In Proceedings of the 2014 international symposium on Low power electronics and design, pages 105–110. ACM, 2014.
David Wolpert and Paul Ampadu. Temperature effects in semiconductors. In Managing temperature effects in nanoscale adaptive systems, pages 15–33. Springer, 2012.
Warin Sootkaneung, Sasithorn Chookaew, and Suppachai Howimanporn. Combined Impact of BTI and Temperature Effect Inversion on Circuit Performance. In Asian Test Symposium (ATS), 2016 IEEE 25th, pages 310–315. IEEE, 2016.
Yazhou Zu, Wei Huang, Indrani Paul, and Vijay Janapa Reddi. Ti-states: Processor Power Management in the Temperature Inversion Region. In Microarchitecture (MICRO), 2016 49th Annual IEEE/ACM International Symposium on, pages 1–13. IEEE, 2016.
Katayoun Neshatpour, Wayne Burleson, Amin Khajeh, and Houman Homayoun. Enhancing Power, Performance, and Energy Efficiency in Chip Multiprocessors Exploiting Inverse Thermal Dependence. IEEE Transactions on Very Large Scale Integration (VLSI) Systems, 2018.
Ermao Cai and Diana Marculescu. TEI-turbo: Temperature Effect Inversion-aware Turbo Boost for FinFET-based Multi-core Systems. In Proceedings of the IEEE/ACM International Conference on Computer-Aided Design, pages 500–507. IEEE Press, 2015.
Ermao Cai, Dimitrios Stamoulis, and Diana Marculescu. Exploring Aging Deceleration in FinFET-based Multi-core Systems. In Computer-Aided Design (ICCAD), 2016 IEEE/ACM International Conference on, pages 1–8. IEEE, 2016.
Emanuele Baravelli, Malgorzata Jurczak, Nicolò Speciale, Kristin De Meyer, and Abhisek Dixit. Impact of LER and Random Dopant Fluctuations on FinFET Matching Performance. IEEE transactions on nanotechnology, 7(3):291–298, 2008.
Xingsheng Wang, Andrew R Brown, Binjie Cheng, and Asen Asenov. Statistical Variability and Reliability in Nanoscale FinFETs. In Electron Devices Meeting (IEDM), 2011 IEEE International, pages 5–4. IEEE, 2011.
Shiva Taghipour and Rahebeh Niaraki Asli. Aging Comparative Analysis of High-performance FinFET and CMOS Flip-flops. Microelectronics Reliability, 69:52–59, 2017.
Hai Jiang, SangHoon Shin, Xiaoyan Liu, Xing Zhang, and Muhammad Ashraful Alam. The Impact of Self-Heating on HCI Reliability in High-Performance Digital Circuits. IEEE Electron Device Letters, 38(4):430–433, 2017.
Semiconductor Engineering Reliability Challenges In 16nm FinFET Design:. http://semiengineering.com/reliability-challenges-16nm-finfet-design/.
Mark LaPedus. Interconnect challenges rising: Resistance and capacitance drive need for new materials and approaches. http://semiengineering.com/interconnect-challenges-grow-3/, 2016.
Ning Lu and Richard A Wachnik. Modeling of Resistance in FinFET Local Interconnect. IEEE Transactions on Circuits and Systems I: Regular Papers, 62(8):1899–1907, 2015.
Spencer Tu. Putting the Pieces Together in the Materials Space: Advanced Materials Solutions for 10nm and Beyond. In SEMICON Taiwan, 2015.
Alice Wang, Anantha P Chandrakasan, and Stephen V Kosonocky. Optimal Supply and Threshold Scaling for Subthreshold CMOS Circuits. In VLSI, 2002. Proceedings. IEEE Computer Society Annual Symposium on, pages 7–11. IEEE, 2002.
Nathaniel Pinckney, Lucian Shifren, Brian Cline, Saurabh Sinha, Supreet Jeloka, Ronald G Dreslinski, Trevor Mudge, Dennis Sylvester, and David Blaauw. Near-threshold Computing in FinFET Technologies: Opportunities for Improved Voltage Scalability. In Proceedings of the 53rd Annual Design Automation Conference, page 76. ACM, 2016.
O Weber. FDSOI vs FinFET: differentiating device features for ultra low power & IoT applications. In IC Design and Technology (ICICDT), 2017 IEEE International Conference on, pages 1–3. IEEE, 2017.
Dimitrios Serpanos and Marilyn Wolf. IoT Devices. In Internet-of-Things (IoT) Systems, pages 17–23. Springer, 2018.
Gopal Singh Jamnal, Xiaodong Liu, Lu Fan, and Muthu Ramachandran. Cognitive Internet of Everything (CIoE): State of the Art and Approaches. In Emerging Trends and Applications of the Internet of Things, pages 277–309. IGI Global, 2017.
Byungseok Kang, Daecheon Kim, and Hyunseung Choo. Internet of Everything: A large-scale autonomic IoT gateway. IEEE Transactions on Multi-Scale Computing Systems, 2017.
Massimo Alioto. Enabling the Internet of Things: From Integrated Circuits to Integrated Systems. Springer, 2017.
Brian Bailey. Chip aging becomes design problem. Semiconductor Engineering, 2018.
James H Stathis, M Wang, RG Southwick, EY Wu, BP Linder, EG Liniger, G Bonilla, and H Kothari. Reliability challenges for the 10nm node and beyond. In Electron Devices Meeting (IEDM), 2014 IEEE International, pages 20–6. IEEE, 2014.
Christian Schlünder et al. On the influence of BTI and HCI on parameter variability. In Reliability Physics Symposium (IRPS), 2017 IEEE International, pages 2E–4. IEEE, 2017.
Ann Mutschler. Transistor Aging Intensifies At 10/7nm And Below. https://semiengineering.com/transistor-aging-intensifies-10nm/, 2017. [Online; accessed 13-July-2017].
Ed Sperling. Chip Aging Accelerates. Semiconductor Engineering, 2018.
Jacopo Franco, Salvatore Graziano, Ben Kaczer, Felice Crupi, L-Å Ragnarsson, Tibor Grasser, and Guido Groeseneken. Bti reliability of ultra-thin eot mosfets for sub-threshold logic. Microelectronics Reliability, 52(9):1932–1935, 2012.
Jeff Sather. Battery technologies for iot. In Enabling the Internet of Things, pages 409–440. Springer, 2017.
Scott Lerner and Baris Taskin. Workload-aware ASIC flow for lifetime improvement of multi-core IoT processors. In Quality Electronic Design (ISQED), 2017 18th International Symposium on, pages 379–384. IEEE, 2017.
Ajith Sivadasan, S Mhira, Armelle Notin, A Benhassain, V Huard, Etienne Maurin, F Cacho, L Anghel, and A Bravaix. Architecture-and workload-dependent digital failure rate. In Reliability Physics Symposium (IRPS), 2017 IEEE International, pages CR–8. IEEE, 2017.
Victor van Santen et al. Reliability in Super-and Near-Threshold Computing: A Unified Model of RTN, BTI, and PV. TCAS-I, 2017.
Jayavardhana Gubbi, Rajkumar Buyya, Slaven Marusic, and Marimuthu Palaniswami. Internet of Things (IoT): A vision, architectural elements, and future directions. Future generation computer systems, 29(7):1645–1660, 2013.
Davide Rossi, Francesco Conti, Andrea Marongiu, Antonio Pullini, Igor Loi, Michael Gautschi, Giuseppe Tagliavini, Alessandro Capotondi, Philippe Flatresse, and Luca Benini. Pulp: A parallel ultra low power platform for next generation iot applications. In Hot Chips 27 Symposium (HCS), 2015 IEEE, pages 1–39. IEEE, 2015.
T Grasser, M Waltl, G Rzepa, W Goes, Y Wimmer, A-M El-Sayed, AL Shluger, H Reisinger, and B Kaczer. The “permanent” component of nbti revisited: Saturation, degradation-reversal, and annealing. In Reliability Physics Symposium (IRPS), 2016 IEEE International, pages 5A–2. IEEE, 2016.
Minki Cho, Stephen T Kim, Carlos Tokunaga, Charles Augustine, Jaydeep P Kulkarni, Krishnan Ravichandran, James W Tschanz, Muhammad M Khellah, and Vivek De. Postsilicon voltage guard-band reduction in a 22 nm graphics execution core using adaptive voltage scaling and dynamic power gating. IEEE Journal of Solid-State Circuits, 52(1):50–63, 2017.
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Guo, X., Stan, M.R. (2020). Design and Aging Challenges in FinFET Circuits and Internet of Things (IoT) Applications. In: Circadian Rhythms for Future Resilient Electronic Systems. Springer, Cham. https://doi.org/10.1007/978-3-030-20051-0_6
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