Table of contents

  1. Front Matter
  2. Anjana Devi, Rochus Schmid, Jens Müller, Roland A. Fischer
    Pages 49-80
  3. Matti Putkonen, Lauri Niinistö
    Pages 125-145
  4. Philippe Serp, Jean-Cyrille Hierso, Philippe Kalck
    Pages 147-171
  5. Back Matter

About this book

Introduction

Material synthesis by the transformation of organometallic compounds (precursors) by vapor deposition techniques such as chemical vapor deposition (CVD) and atomic layer deposition (ALD) has been in the forefront of modern day research and development of new materials. There exists a need for new routes for designing and synthesizing new precursors as well as the application of established molecular precursors to derive tuneable materials for technological demands. With regard to the precursor chemistry, a most detailed understanding of the mechanistic complexity of materials formation from molecular precursors is very important for further development of new processes and advanced materials. To emphasize and stimulate research in these areas, this volume comprises a selection of case studies covering various key-aspects of the interplay of precursor chemistry with the process conditions of materials formation, particularly looking at the similarities and differences of CVD, ALD and nanoparticle synthesis, e.g. colloid chemistry, involving tailored molecular precursors.

Keywords

Chemical Vapour Deposition Inorganic Chemistry Materials Science Organometallic Chemistry Precursors Thin Films chemistry thermochemistry

Bibliographic information

  • DOI https://doi.org/10.1007/b75019
  • Copyright Information Springer-Verlag Berlin Heidelberg 2005
  • Publisher Name Springer, Berlin, Heidelberg
  • eBook Packages Chemistry and Materials Science
  • Print ISBN 978-3-540-01605-2
  • Online ISBN 978-3-540-31451-6
  • Series Print ISSN 1436-6002
  • About this book
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