Epitaxy

Physical Principles and Technical Implementation

  • Marian A. Herman
  • Wolfgang Richter
  • Helmut Sitter

Part of the Springer Series in MATERIALS SCIENCE book series (SSMATERIALS, volume 62)

Table of contents

  1. Front Matter
    Pages I-XV
  2. Basic Concepts

    1. Front Matter
      Pages 1-1
    2. Marian A. Herman, Wolfgang Richter, Helmut Sitter
      Pages 3-10
    3. Marian A. Herman, Wolfgang Richter, Helmut Sitter
      Pages 11-34
    4. Marian A. Herman, Wolfgang Richter, Helmut Sitter
      Pages 35-42
  3. Technical Implementation

    1. Front Matter
      Pages 43-43
    2. Marian A. Herman, Wolfgang Richter, Helmut Sitter
      Pages 45-62
    3. Marian A. Herman, Wolfgang Richter, Helmut Sitter
      Pages 63-80
    4. Marian A. Herman, Wolfgang Richter, Helmut Sitter
      Pages 81-129
    5. Marian A. Herman, Wolfgang Richter, Helmut Sitter
      Pages 131-170
    6. Marian A. Herman, Wolfgang Richter, Helmut Sitter
      Pages 171-200
  4. In-situ Analysis of the Growth Processes

    1. Front Matter
      Pages 201-201
    2. Marian A. Herman, Wolfgang Richter, Helmut Sitter
      Pages 203-223
    3. Marian A. Herman, Wolfgang Richter, Helmut Sitter
      Pages 225-264
  5. Physics of Epitaxy

    1. Front Matter
      Pages 265-265
    2. Marian A. Herman, Wolfgang Richter, Helmut Sitter
      Pages 267-320
    3. Marian A. Herman, Wolfgang Richter, Helmut Sitter
      Pages 321-350
    4. Marian A. Herman, Wolfgang Richter, Helmut Sitter
      Pages 351-386
  6. Heteroepitaxy

    1. Front Matter
      Pages 387-387
    2. Marian A. Herman, Wolfgang Richter, Helmut Sitter
      Pages 389-421

About this book

Introduction

Epitaxy provides readers with a comprehensive treatment of the modern models and modifications of epitaxy, together with the relevant experimental and technological framework. This advanced textbook describes all important aspects of the epitaxial growth processes of solid films on crystalline substrates, including a section on heteroepitaxy. It covers and discusses in details the most important epitaxial growth techniques, which are currently widely used in basic research as well as in manufacturing processes of devices, namely solid-phase epitaxy, liquid-phase epitaxy, vapor-phase epitaxy, including metal-organic vapor-phase epitaxy and molecular-beam epitaxy. Epitaxy’s coverage of science and texhnology thin-film is intended to fill the need for a comprehensive reference and text examining the variety of problems related to the physical foundations and technical implementation of epitaxial crystallization. It is intended for undergraduate students, PhD students, research scientists, lecturers and practicing engineers interested in materials science, solid state electronics and crystal growth.

Keywords

Epilayers in device structures Epitaxy Helium-Atom-Streuung Heterostructures Strained layer growth Thin film crystallization and characterization crystal vapor

Authors and affiliations

  • Marian A. Herman
    • 1
  • Wolfgang Richter
    • 2
    • 3
  • Helmut Sitter
    • 4
  1. 1.Wissenschaftliches ZentrumPolnischen Akademie der WissenschaftenWienAustria
  2. 2.Institut für FestkörperphysikTechnische Universität BerlinBerlinGermany
  3. 3.INFM, Dipartimento di FisicaUniversità di Roma Tor VergataRomaItaly
  4. 4.Johannes-Kepler-UniversitätLinzAustria

Bibliographic information

  • DOI https://doi.org/10.1007/978-3-662-07064-2
  • Copyright Information Springer-Verlag Berlin Heidelberg 2004
  • Publisher Name Springer, Berlin, Heidelberg
  • eBook Packages Springer Book Archive
  • Print ISBN 978-3-642-08737-0
  • Online ISBN 978-3-662-07064-2
  • Series Print ISSN 0933-033X
  • Series Online ISSN 2196-2812
  • About this book
Industry Sectors
Chemical Manufacturing