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Laser Processing and Diagnostics

Proceedings of an International Conference, University of Linz, Austria, July 15–19, 1984

  • Conference proceedings
  • © 1984

Overview

Editors:
  1. Dieter Bäuerle

    1. Institut für Angewandte Physik, Johannes-Kepler-Universität, Linz, Austria

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Part of the book series: Springer Series in Chemical Physics (CHEMICAL, volume 39)

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Table of contents (70 papers)

  1. Photophysics and Chemistry of Molecule — Surface Interactions

    1. Selective Laser-Induced Heterogeneous Chemistry on Surfaces

      • C. T. Lin
      Pages 137-142

    2. Spectroscopy of Adsorbates by Transient Laser Calorimetry

      • H. Coufal, T. J. Chuang, F. Träger
      Pages 143-147

    3. Laser Vaporization of Clean and CO-Covered Polycrystalline Copper Surfaces

      • R. Viswanathan, Ingo Hussla
      Pages 148-153

    4. Laser Investigation of the Dynamics of Molecule-Surface Interactions

      • J. Häger, Y. R. Shen, H. Walther
      Pages 154-163

  2. Photoassisted Chemical Processing

    1. Front Matter

      Pages 165-165
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    2. Deposition

      1. Laser-Induced Chemical Vapor Deposition
        • Dieter Bäuerle
        Pages 166-182
      2. Structure of Platinum and Tin Films Formed by Laser-Induced Chemical Vapor Deposition
        • D. Braichotte, H. van den Bergh
        Pages 183-187
      3. Laser Deposition of Single Crystalline GaAs and Stimulated Sheet Doping
        • H. Beneking
        Pages 188-196
      4. IR Laser Photo-Assisted Deposition of Silicon Films
        • M. Hanabusa, H. Kikuchi, T. Iwanaga, K. Sugai
        Pages 197-204
      5. IR Laser Pyrolysis of Silane
        • V. V. Nosov, S. M. Repinskii, F. N. Dulcev
        Pages 205-209
      6. Multiphoton Excitation and Dissociation of SiH4 Exposed to CO2 Laser Radiation
        • M. Snels, E. Borsella, R. Fantoni, A. Giardini-Guidoni
        Pages 210-214
      7. Deposition of Silicon Films by Photodissociation of Silane Under IR Laser Irradiation
        • Y. Pauleau, D. Tonneau, G. Auvert
        Pages 215-220
      8. Characterization of Reactive Intermediates in Silicon Etching and Deposition Using Laser Techniques
        • S. A. Joyce, B. Roop, J. C. Schultz, K. Suzuki, J. Thoman, J. I. Steinfeld
        Pages 221-224
      9. The Physics of Ultraviolet Photodeposition
        • H. H. Gilgen, C. J. Chen, R. Krchnavek, R. M. Osgood Jr.
        Pages 225-233
      10. Low Temperature Growth of HgTe by a UV Photosensitisation Method
        • S. J. C. Irvine, J. B. Mullin, J. Tunnicliffe
        Pages 234-238
      11. Applications of Excimer Lasers to Semiconductor Processing
        • T. F. Deutsch
        Pages 239-251
      12. Linear-Focused ArF Excimer Laser Beam for Depositing Hydrogenated Silicon Films
        • M. Murahara, K. Toyoda
        Pages 252-256
      13. Analysis of UV Laser-Induced Heterogeneous Deposition: Platinum
        • H. Schröder, I. Gianinoni, D. Masci, K. L. Kompa
        Pages 257-262
      14. Laser Photolytic Deposition of Metals on Indium Phosphide
        • M. R. Aylett, J. Halgh
        Pages 263-268
      15. Laser Photochemical Deposition of Metals
        • A. E. Adams, M. L. Lloyd, S. L. Morgan, N. G. Davis
        Pages 269-273
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Editors and Affiliations

  • Institut für Angewandte Physik, Johannes-Kepler-Universität, Linz, Austria

    Dieter Bäuerle

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