Authors:
- Introduces a highly promising patterning solution for next generation technology
- Provides a comprehensive overview of directed self-assembly lithography (DSAL) friendly physical design and DSAL-aware mask synthesis
- Written by leading developers of this technology
Part of the book series: NanoScience and Technology (NANO)
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Table of contents (10 chapters)
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Front Matter
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Physical Design Optimizations
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Front Matter
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Mask Synthesis and Optimizations
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Front Matter
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Back Matter
About this book
This book discusses physical design and mask synthesis of directed self-assembly lithography (DSAL). It covers the basic background of DSAL technology, physical design optimizations such as placement and redundant via insertion, and DSAL mask synthesis as well as its verification. Directed self-assembly lithography (DSAL) is a highly promising patterning solution in sub-7nm technology.
Authors and Affiliations
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Samsung Electronics, Hwasung, Korea (Republic of)
Seongbo Shim
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KAIST, Daejeon, Korea (Republic of)
Youngsoo Shin
About the authors
Seongbo Shim received B.S. and M.S. degrees in physics from Seoul National University, Korea, in 2004 and 2006 respectively, and a Ph.D. in electrical engineering from KAIST, Korea, in 2016. From 2006 to 2012, he was with the Semiconductor R&D Center, Samsung Electronics, where he was a Senior Engineer working on photolithography, computational lithography, optical proximity correction (OPC), and design for manufacturability (DFM) for advanced technologies. He has authored more than 40 papers on lithography, OPC, and DFM. He is the holder of 15 patents. His research interests include mask synthesis algorithms, VLSI CAD for the design-manufacturing interface, design technology co-optimization (DTCO) for emerging technologies, and machine learning for lithography optimizations.
Youngsoo Shin received B.S., M.S., and Ph.D. degrees in Electronics Engineering from Seoul National University, Korea. From 2001 to 2004, he was a Research Staff Member at the IBM T. J. Watson Research Center, Yorktown Heights, NY, USA. In 2004, he joined the Department of Electrical Engineering, KAIST, Korea, where he is currently a professor. He has served as a Program Chair of ICCD in 2014 and VLSI-SoC in 2015, and as a General Chair of ASP-DAC in 2018. He is an associate editor of IEEE Transactions on CAD and IEEE Design and Test. He is an IEEE Fellow.
Bibliographic Information
Book Title: Physical Design and Mask Synthesis for Directed Self-Assembly Lithography
Authors: Seongbo Shim, Youngsoo Shin
Series Title: NanoScience and Technology
DOI: https://doi.org/10.1007/978-3-319-76294-4
Publisher: Springer Cham
eBook Packages: Chemistry and Materials Science, Chemistry and Material Science (R0)
Copyright Information: Springer International Publishing AG, part of Springer Nature 2018
Hardcover ISBN: 978-3-319-76293-7Published: 03 April 2018
Softcover ISBN: 978-3-030-09455-3Published: 08 February 2019
eBook ISBN: 978-3-319-76294-4Published: 21 March 2018
Series ISSN: 1434-4904
Series E-ISSN: 2197-7127
Edition Number: 1
Number of Pages: XIV, 138
Number of Illustrations: 38 b/w illustrations, 54 illustrations in colour
Topics: Nanotechnology, Nanotechnology and Microengineering, Circuits and Systems, Optical and Electronic Materials, Nanoscale Science and Technology, Semiconductors
Industry Sectors: Biotechnology, Chemical Manufacturing, Electronics, IT & Software, Materials & Steel