Evolution of Thin Film Morphology

Modeling and Simulations

  • Matthew Pelliccione
  • Toh-Ming Lu

Part of the Materials Science book series (SSMATERIALS, volume 108)

Table of contents

  1. Front Matter
    Pages I-XI
  2. Description of Thin Film Morphology

    1. Pages 1-10
    2. Pages 13-28
    3. Pages 29-46
    4. Pages 47-58
  3. Continuum Surface Growth Models

  4. Discrete Surface Growth Models

    1. Pages 101-120
    2. Pages 143-144
  5. Back Matter
    Pages 145-206

About this book

Introduction

Thin film deposition is the most ubiquitous and critical of the processes used to manufacture high tech devices. Morphology and microstructure of thin films directly controls their optical, magnetic, and electrical properties. This book focuses on modeling and simulations used in research on the morphological evolution during film growth. The authors emphasize the detailed mathematical formulation of the problem both through numerical calculations based on Langevin continuum equations, and through Monte Carlo simulations based on discrete surface growth models when an analytical formulism is not convenient. Evolution of Thin-Film Morphology will be of benefit to university researchers and industrial scientists working in the areas of semiconductor processing, optical coating, plasma etching, patterning, micro-machining, polishing, tribology, and any discipline that requires an understanding of thin film growth processes. In particular, the reader will be introduced to the mathematical tools that are available to describe such a complex problem, and appreciate the utility of the various modeling methods through numerous example discussions. For beginners in the field, the text is written assuming a minimal background in mathematics and computer programming. The book will enable readers themselves to set up a computational program to investigate specific topics of interest in thin film deposition.

Keywords

Helium-Atom-Streuung REM aggregation models coating continuum equations modeling morphology plasma etching programming surfaces thin film tribology

Authors and affiliations

  • Matthew Pelliccione
    • 1
  • Toh-Ming Lu
    • 1
  1. 1.Department of Physics, Applied Physics and Astronomy, and Center for Integrated ElectronicsRensselaer Polytechnic InstituteTroyUSA

Bibliographic information

  • DOI https://doi.org/10.1007/978-0-387-75109-2
  • Copyright Information Springer-Verlag New York 2008
  • Publisher Name Springer, New York, NY
  • eBook Packages Chemistry and Materials Science
  • Print ISBN 978-0-387-75108-5
  • Online ISBN 978-0-387-75109-2
  • Series Print ISSN 0933-033X
  • Series Online ISSN 2196-2812
  • About this book
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