© 2003

Photo-Excited Processes, Diagnostics and Applications

Fundamentals and Advanced Topics

  • A. Peled

Table of contents

  1. Front Matter
    Pages i-xv
  2. L. Perfetti, M. Grioni, G. Margaritondo
    Pages 1-24
  3. V. I. Vlad, E. Fazio, M. J. Damzen, A. Petris
    Pages 57-100
  4. Ivan Biaggio
    Pages 101-120
  5. S. I. Anisimov, N. M. Bityurin, B. S. Luk’yanchuk
    Pages 121-159
  6. Ian W. Boyd, Jun-Ying Zhang, Ulrich Kogelschatz
    Pages 161-199
  7. Armando Luches, Anna Paola Caricato
    Pages 225-250
  8. Aaron Peled, Nina Mirchin
    Pages 251-280
  9. K. Zimmer, A. Braun
    Pages 301-338
  10. Yoshizo Kawaguchi, Hiroyuki Niino, Akira Yabe
    Pages 339-357
  11. Back Matter
    Pages 359-370

About this book


Photo-Excited Processes, Diagnostics and Applications covers the area of photo-excitation and processing of materials by photons from the basic principles and theories to applications, from IR to x-rays, from gas phase to liquid and solid phases. The various chapters give a wide spectral view of this developing field.

Twelve leading groups worldwide set down to write this book during the past two years which include the most updated techniques used in their laboratories for investigating photo-excited processes and new applications. This book will be useful to scientists and engineers who have a strong interest in photo-assisted processes development for microelectronics and photonics.


Absorption Phase UV development exciton laser machining photonics spectra

Editors and affiliations

  • A. Peled
    • 1
  1. 1.Holon Academic Institute of TechnologyIsrael

Bibliographic information

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