Plasma-Surface Interactions and Processing of Materials

  • Orlando Auciello
  • Alberto Gras-Marti
  • Jose Antonia Valles-Abarca
  • Daniel L. Flamm

Part of the NATO ASI Series book series (NSSE, volume 176)

Table of contents

  1. Front Matter
    Pages i-xiii
  2. Daniel L. Flamm
    Pages 35-55
  3. V. A. Godyak
    Pages 95-134
  4. Alberto Gras-Martí, José-Antonio Vallés-Abarca, Juan-Carlos Moreno-Marín
    Pages 135-146
  5. J. Bretagne, D. Jacquin, R. Ferdinand
    Pages 147-150
  6. J. L. Marchand, H. Michel, D. Ablitzer, M. Gantois, A. Ricard, J. Szekely
    Pages 155-158
  7. J. B. Almeida, F. Guimaraes, M. M. D. Ramos
    Pages 159-162
  8. J. P. Booth, G. Hancock, N. D. Perry, M. J. Toogood
    Pages 167-169
  9. G. Cicala, D. L. Flamm, D. E. Ibbotson, J. A. Mucha
    Pages 171-173
  10. J. C. Martz, D. W. Hess, W. E. Anderson
    Pages 175-178
  11. Y. De Puydt, P. Bertrand, Y. Novis, M. Chtaib, P. Lutgen, G. Feyder
    Pages 179-183
  12. Herbert M. Urbassek
    Pages 185-199
  13. Orlando Auciello
    Pages 201-249
  14. James M. E. Harper
    Pages 251-280
  15. T. I. Cox, V. G. I. Deshmukh, D. G. Armour
    Pages 319-321
  16. A. Patentalaki, M. Androulidaki, G. Kiriakidis
    Pages 331-333
  17. N. E. Capuj, N. R. Arista, G. H. Lantchsner, J. C. Eckardt, M. M. Jakas
    Pages 335-338
  18. Hans W. Lehmann
    Pages 345-375
  19. W. A. P. Claassen, G. M. J. Rutten
    Pages 401-424
  20. R. d’Agostino
    Pages 425-456
  21. A. J. Hydes, T. I. Cox, D. A. O. Hope, V. G. I. Deshmukh
    Pages 499-501
  22. M. A. Hartney, D. W. Hess, D. S. Soane
    Pages 503-505
  23. V. Andre, F. Tchoubineh, F. Arefi, J. Amouroux
    Pages 507-510
  24. F. Poncin-Epaillard, J. C. Brosse, J. Bretagne, A. Ricard
    Pages 515-517
  25. E. Piskin, M. Kiremitci, V. Evren, M. Mutlu, A. Oncu, A. Denizli et al.
    Pages 525-529
  26. A. Climent, R. Perez-Casero, J. Perriere, J. P. Enard, B. Lavernhe
    Pages 531-533
  27. F. Guimaraes, J. Almeida, R. Barral
    Pages 535-538
  28. M. Baki Karamis, Bekir Sami Yilbas
    Pages 543-546
  29. A. Bonanno, M. Camarca, R. Bartucci, L. Sportelli, E. Colavita, S. Barbanera et al.
    Pages 551-553
  30. Back Matter
    Pages 555-557

About this book


An understanding of the processes involved in the basic and applied physics and chemistry of the interaction of plasmas with materials is vital to the evolution of technologies such as those relevant to microelectronics, fusion and space.
The subjects dealt with in the book include: the physics and chemistry of plasmas, plasma diagnostics, physical sputtering and chemical etching, plasma assisted deposition of thin films, ion and electron bombardment, and plasma processing of inorganic and polymeric materials.
The book represents a concentration of a substantial amount of knowledge acquired in this area - knowledge which was hitherto widely scattered throughout the literature - and thus establishes a baseline reference work for both established and tyro research workers.


Polymer RSI alloy crystal diffraction electron diffraction modeling spectroscopy structural analysis

Editors and affiliations

  • Orlando Auciello
    • 1
    • 2
  • Alberto Gras-Marti
  • Jose Antonia Valles-Abarca
    • 3
  • Daniel L. Flamm
    • 4
    • 5
  1. 1.Microelectronics Center of North CarolinaResearch Triangle ParkUSA
  2. 2.North Carolina State UniversityResearch Triangle ParkUSA
  3. 3.University of AlicanteAlicanteSpain
  4. 4.AT&T Bell LaboratoriesMurray HillUSA
  5. 5.University of CaliforniaBerkeleyUSA

Bibliographic information

  • DOI
  • Copyright Information Springer Science+Business Media B.V. 1990
  • Publisher Name Springer, Dordrecht
  • eBook Packages Springer Book Archive
  • Print ISBN 978-94-010-7369-1
  • Online ISBN 978-94-009-1946-4
  • Series Print ISSN 0168-132X
  • Buy this book on publisher's site
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