Emerging Technologies for In Situ Processing

  • Daniel J. Ehrlich
  • Van Tran Nguyen

Part of the NATO ASI Series book series (NSSE, volume 139)

Table of contents

  1. Front Matter
    Pages i-x
  2. D. Bauerle, T. Szorenyi, G. Q. Zhang, K. Piglmayer, M. Eyett, R. Kullmer
    Pages 33-43
  3. J. P. Harbison, P. F. Liao, D. M. Hwang, E. Kapon, M. C. Tamargo, G. E. Derkits Jr et al.
    Pages 55-60
  4. P. N. Favennec, H. L’Haridon, M. Salvi, L. Henry, A. Le Corre, D. Lecrosnier et al.
    Pages 61-70
  5. R. L. Jackson, T. T. Kodas, G. W. Tyndall, T. H. Baum, P. B. Comita
    Pages 71-81
  6. M. Rothschild, D. J. Ehrlich
    Pages 93-104
  7. P. H. Key, P. E. Dyer, R. D. Greenough
    Pages 105-112
  8. Gerhard Stengl, Hans Loschner, Ernst Hammel, Edward D. Wolf, Julius J. Muray
    Pages 113-120
  9. J. E. Bouree, J. Flicstein
    Pages 121-129
  10. Mino Green, Constantine Aidinis, Olasebikan Fakolujo
    Pages 131-136
  11. T. Dupeux, P. Deroux-Dauphin, G. Nicolas, D. Leti
    Pages 137-143
  12. J. Melngailis, A. D. Dubner, J. S. Ro, G. M. Shedd, H. Lezec, C. V. Thompson
    Pages 153-161
  13. R. Putzar, H.-C. Petzold, U. Weigmann
    Pages 163-169

About this book

Keywords

Phase Wafer X-Ray development laser liquid manufacturing semiconductor devices semiconductors thin films

Editors and affiliations

  • Daniel J. Ehrlich
    • 1
  • Van Tran Nguyen
    • 2
  1. 1.Lincoln LaboratoryMassachusetts Institute of TechnologyLexingtonUSA
  2. 2.Physics and Technologies Research DivisionCNET-GrenobleFrance

Bibliographic information

  • DOI https://doi.org/10.1007/978-94-009-1409-4
  • Copyright Information Springer Science+Business Media B.V. 1988
  • Publisher Name Springer, Dordrecht
  • eBook Packages Springer Book Archive
  • Print ISBN 978-94-010-7130-7
  • Online ISBN 978-94-009-1409-4
  • Series Print ISSN 0168-132X
  • About this book
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