Proceedings of the International Symposium on Photoelasticity, Tokyo, 1986

  • Masataka Nisida
  • Kozo Kawata

Table of contents

  1. Front Matter
    Pages I-XVI
  2. Survey

  3. Visco-Elasto-Plastic Behaviour

  4. Moire and Speckle

    1. Daniel Post
      Pages 39-46
    2. Y. Morimoto, T. Hayashi
      Pages 47-52
    3. Ichirou Yamaguchi
      Pages 65-72
  5. High Speed Photoelasticity

  6. High Speed Photoelasticity

  7. Caustics and Stress Intensity Factor

    1. J. F. Kalthoff
      Pages 109-120
    2. K. Shimizu, S. Takahashi, H. T. Danyluk
      Pages 121-128
    3. K. Takahashi, N. Takeda, A. E. Abo-El-Ezz
      Pages 129-134
  8. Caustics and Stress Intensity Factor

  9. New Techniques in Photoelasticity

    1. L. S. Srinath
      Pages 159-166
    2. Ryuichi Shintani, Toshiharu Yoshikawa, Toshimitsu Funayoshi
      Pages 167-172
  10. New Techniques in Photoelasticity

    1. Gengo Matsui, Teruaki Tanaka, Hidetoshi Yokomise
      Pages 179-185
  11. Stresses in Structures

    1. K. Uchino, T. Kamiyama, T. Inamura, K. Simokohge, H. Aono, T. Kawashima
      Pages 209-214
  12. Stresses in Structures

  13. Propagation of Polarized Light

  14. Numerical Method of Stress Analysis

About these proceedings


Thirty-five papers were presented at the International Symposium on Photoelasticity, Tokyo, 1986, representing fifty-five authors. Eighteen of these papers were presented by Japanese photoelasticians and seventeen by leading foreign authorities from eleven countries (Austria, Canada, Czechoslovakia, F.R. of Germany, France, Greece, India, Switzerland, UK, USA and USSR) • This is the first symposium on photoelasticity of international scope held in Japan. The primary objectives of this symposium are to help bridge the gap between photoelastic researchers around the world, to promote mutual understanding and communications and to facilitate exchange of newly acquired knowledge in theories and techniques. In addition, it is important that these valuable results are communicated effectively to engineers who can apply them in practice in industry. The papers presented at this symposium cover all branches of photo­ elasticity in a broad sense, including, in addition to long estab­ lished photoelasticity, newly developed moire, interferometric, and holographic photoelasticity, caustics and speckle. Therefore, from an optical stress analysis pe~spective, this volume is the latest compre­ hensive collection of photoelastic expertises.



Editors and affiliations

  • Masataka Nisida
    • 1
  • Kozo Kawata
    • 1
  1. 1.Faculty of Science and TechnologyScience University of TokyoNoda, Chiba 278Japan

Bibliographic information

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