© 2018

Tetrahedrally Bonded Amorphous Carbon Films I

Basics, Structure and Preparation


Part of the Springer Series in Materials Science book series (SSMATERIALS, volume 263)

Table of contents

  1. Front Matter
    Pages i-xxxii
  2. Carbon Materials and Coatings

    1. Front Matter
      Pages 1-1
    2. Bernd Schultrich
      Pages 3-40
    3. Bernd Schultrich
      Pages 41-83
    4. Bernd Schultrich
      Pages 85-104
    5. Bernd Schultrich
      Pages 105-110
    6. Bernd Schultrich
      Pages 111-192
  3. Structural Development of ta-C Films

    1. Front Matter
      Pages 193-193
    2. Bernd Schultrich
      Pages 195-272
    3. Bernd Schultrich
      Pages 273-298
    4. Bernd Schultrich
      Pages 299-370
  4. Vacuum Arc Deposition of Carbon Films

    1. Front Matter
      Pages 371-371
    2. Bernd Schultrich
      Pages 373-452
    3. Bernd Schultrich
      Pages 453-491
    4. Bernd Schultrich
      Pages 493-526
  5. Deposition of ta-C Films by Pulsed Laser and by Sputtering

    1. Front Matter
      Pages 583-583
    2. Bernd Schultrich
      Pages 585-631
    3. Bernd Schultrich
      Pages 633-659

About this book


This book presents the status quo of the structure, preparation, properties and applications of tetrahedrally bonded amorphous carbon (ta-C) films and compares them with related film systems.
Tetrahedrally bonded amorphous carbon films (ta-C) combine some of the outstanding properties of diamond with the versatility of amorphous materials. The book compares experimental results with the predictions of theoretical analyses, condensing them to practicable rules. It is strictly application oriented, emphasizing the exceptional potential of ta-C for tribological coatings of tools and components.


Amorphous carbon Application of amorphous carbon films Structure and properties of carbon films Thin carbon films Tribology of carbon films

Authors and affiliations

  1. 1.Fraunhofer Institut für Werkstoff- und StrahltechnikDresdenGermany

About the authors

After some years in the semiconductor industry, Prof. Schultrich (born 1942) worked for more than ten years at the Technical University of Dresden, Dresden in the field of theoretical physics and its application to the micromechanics of solids. He then joined the Central Institute of Solid State Physics and Materials Research of the Academy of Sciences, Dresden working for ten years on fundamental problems of preparation and properties of refractory carbides and nitrides and corresponding composites (hardmetals and cermets) and their application in the tool industry. From 1990 up to his retirement, he headed the PVD (physical vapour deposition) thin film department in the Fraunhofer Institute for Materials and Beam Technology, Dresden. His activities were concentrated on arc and laser-assisted ablation and deposition technologies for industrial applications with the main focus on carbon-based materials. Here his group achieved the breakthrough for the industrial maturity of ta-C (tetrahedral amorphous carbon) films and their preparation.

Bibliographic information

Industry Sectors
Chemical Manufacturing