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© 2004

Epitaxy

Physical Principles and Technical Implementation

  • An important advantage of this book against monographs devoted to one detailed method of epitaxial crystallization, e.g. MBE, CBE, MOVPE or ALE, is that it allows the non-specialist in the definite growth technique to learn about the characteristic technological features of all the other methods

  • Contains an up-dated reference list of more than 1000 positions

Book

Part of the Springer Series in MATERIALS SCIENCE book series (SSMATERIALS, volume 62)

Table of contents

  1. Front Matter
    Pages I-XV
  2. Basic Concepts

    1. Front Matter
      Pages 1-1
    2. Marian A. Herman, Wolfgang Richter, Helmut Sitter
      Pages 3-10
    3. Marian A. Herman, Wolfgang Richter, Helmut Sitter
      Pages 11-34
    4. Marian A. Herman, Wolfgang Richter, Helmut Sitter
      Pages 35-42
  3. Technical Implementation

    1. Front Matter
      Pages 43-43
    2. Marian A. Herman, Wolfgang Richter, Helmut Sitter
      Pages 45-62
    3. Marian A. Herman, Wolfgang Richter, Helmut Sitter
      Pages 63-80
    4. Marian A. Herman, Wolfgang Richter, Helmut Sitter
      Pages 81-129
    5. Marian A. Herman, Wolfgang Richter, Helmut Sitter
      Pages 131-170
    6. Marian A. Herman, Wolfgang Richter, Helmut Sitter
      Pages 171-200
  4. In-situ Analysis of the Growth Processes

    1. Front Matter
      Pages 201-201
    2. Marian A. Herman, Wolfgang Richter, Helmut Sitter
      Pages 203-223
    3. Marian A. Herman, Wolfgang Richter, Helmut Sitter
      Pages 225-264
  5. Physics of Epitaxy

    1. Front Matter
      Pages 265-265
    2. Marian A. Herman, Wolfgang Richter, Helmut Sitter
      Pages 267-320
    3. Marian A. Herman, Wolfgang Richter, Helmut Sitter
      Pages 321-350
    4. Marian A. Herman, Wolfgang Richter, Helmut Sitter
      Pages 351-386
  6. Heteroepitaxy

    1. Front Matter
      Pages 387-387
    2. Marian A. Herman, Wolfgang Richter, Helmut Sitter
      Pages 389-421

About this book

Introduction

Epitaxy provides readers with a comprehensive treatment of the modern models and modifications of epitaxy, together with the relevant experimental and technological framework. This advanced textbook describes all important aspects of the epitaxial growth processes of solid films on crystalline substrates, including a section on heteroepitaxy. It covers and discusses in details the most important epitaxial growth techniques, which are currently widely used in basic research as well as in manufacturing processes of devices, namely solid-phase epitaxy, liquid-phase epitaxy, vapor-phase epitaxy, including metal-organic vapor-phase epitaxy and molecular-beam epitaxy. Epitaxy’s coverage of science and texhnology thin-film is intended to fill the need for a comprehensive reference and text examining the variety of problems related to the physical foundations and technical implementation of epitaxial crystallization. It is intended for undergraduate students, PhD students, research scientists, lecturers and practicing engineers interested in materials science, solid state electronics and crystal growth.

Keywords

Epilayers in device structures Epitaxy Helium-Atom-Streuung Heterostructures Strained layer growth Thin film crystallization and characterization crystal vapor

Authors and affiliations

  1. 1.Wissenschaftliches ZentrumPolnischen Akademie der WissenschaftenWienAustria
  2. 2.Institut für FestkörperphysikTechnische Universität BerlinBerlinGermany
  3. 3.INFM, Dipartimento di FisicaUniversità di Roma Tor VergataRomaItaly
  4. 4.Johannes-Kepler-UniversitätLinzAustria

Bibliographic information

Reviews

From the reviews:

"Epitaxy has become increasingly important … . Still, a good monograph on this issue was lacking …. This gap is finally filled with a book that finds a good equilibrium … . As such, it will be very useful to students who are interested in advanced thin film growth, and researchers active in the field of low-dimensional heterostructures. … Throughout the work, a large number of references are cited … . this book will be a good guide for people interested in the growth and properties of low dimensional heterostructures and nanostructures." (André Vantomme, Physicalia, Vol. 57 (3), 2005)

"The book … contains experimental and theoretical aspects of the epitaxial growth process including very recent developments in a compact and clear manner. … represents a good opportunity for the interested reader to get used to the field of epitaxial growth of materials and should be of high interest to students, scientists, and engineers working in the field of material research, device research, and solid state physics or –chemistry. … this book should become a indispensable source of information for all crystal growers." (V. Gottschalch, Zeitschrift für Kristallographie, Issue: 11, 2004)

"In a uniform and comprehensive manner the authors describe all the important aspects of the epitaxial growth processes of solid films on crystalline substrates … . Emphasis is put on sufficiently fundamental and unequivocal presentation of the subject in the form of an easy-to-read review." (Zeitschrift für Kristallographie, Issue: 10, 2004)