Ultraclean Surface Processing of Silicon Wafers

1. Analysis and Evaluation of Silicon Wafer Surfaces: Fundamentals

   1. Analysis of Microscopic Areas on Wafer Surfaces Using STM/AFM

      • Sumio Hosaka

      Pages 223-239

2. Analysis and Evaluation of Wafer Surfaces: Applications to Semiconductor Manufacturing Lines

   1. Front Matter

      Pages 241-241

      PDF

   2. Detection and Analysis of Particles in Production Lines

      • Takeshi Hattori

      Pages 243-258

   3. Pattern Defect Monitoring in Production Lines

      • Yoshiki Suzuki

      Pages 259-270

   4. Clean Level Monitoring in Production Lines

      • Kenji Yoneda

      Pages 271-285

   5. Analysis of Defects in Devices and Silicon Crystals in Production Lines

      • Tomohisa Kitano, Kazuko Ikeda

      Pages 286-302

3. Ultraclean Technology for Wafer Processes and Equipment

   1. Front Matter

      Pages 303-303

      PDF

   2. Oxidation and Diffusion

      • Kikuo Yamabe

      Pages 305-316

   3. CVD (Part 1): Atmospheric Pressure/Low-Pressure CVD

      • Kazuo Maeda

      Pages 317-330

   4. CVD (Part 2): Plasma CVD

      • Masashi Asami

      Pages 331-341

   5. CVD (Part 3): Metal CVD

      • Makoto Sekine

      Pages 342-351

   6. Physical Vapor Deposition

      • Tsuyoshi Takahashi

      Pages 352-360

   7. Dry Etching (Part 1): Particulate Contamination Due to Dry Etching

      • Katsumi Ukai

      Pages 361-370

   8. Dry Etching (Part 2): Influence of Chemical Contamination and Defects on Dry Etching

      • Moritaka Nakamura

      Pages 371-383

   9. Ion Implantation

      • Yasutsugu Usami

      Pages 384-397

   10. Lithography

       • Fumio Mizuno

       Pages 398-413

   11. CMP

       • Yoshihiro Hayashi

       Pages 414-425

   12. Cluster Tools

       • Atsuyoshi Koike

       Pages 426-434

4. Cleaning Silicon Wafer Surfaces

   1. Front Matter

      Pages 435-435

      PDF

   2. Trends in Wafer Cleaning Technology

      • Takeshi Hattori

      Pages 437-450

A totally new concept for clean surface processing of Si wafers is introduced in this book. Some fifty distinguished researchers and engineers from the leading Japanese semiconductor companies, such as NEC, Hitachi, Toshiba, Sony and Panasonic as well as from several universities reveal to us for the first time the secrets of these highly productive institutions. They describe the techniques and equipment necessary for the preparation of clean high-quality semiconductor surfaces as a first step in high-yield/high-quality device production. This book thus opens the door to the manufacturing of reliable nanoscale devices and will be extremely useful for every engineer, physicist and technician involved in the production of silicon semiconductor devices.

• Technologie
• VLSI
• production
• quality
• semiconductor devices

• ULSI R&D Laboratories, Sony Corporation Semiconductor Company, Atsugi, Japan

  Takeshi Hattori

Policies and ethics