© 1993

Surface Science

Principles and Applications

  • Russel F. Howe
  • Robert N. Lamb
  • Klaus Wandelt

Part of the Springer Proceedings in Physics book series (SPPHY, volume 73)

Table of contents

  1. Front Matter
    Pages I-XII
  2. Surface Science Techniques

  3. Metal Surfaces

    1. Front Matter
      Pages 79-79
    2. K. Kern
      Pages 81-94
    3. B. Poelsema, A. F. Becker, R. Kunkel, G. Rosenfeld, L. K. Verheij, G. Comsa
      Pages 95-104
    4. M. N. Read, A. S. Christopoulos
      Pages 116-127
  4. Semiconductor Surfaces

  5. Thin Films

    1. Front Matter
      Pages 175-175
    2. G. L. Mar, P. Y. Timbrell, R. N. Lamb
      Pages 177-192

About this book


Surface science has existed as a recognized discipline for more than 20 years. During this period, the subject has expanded in two important ways. On the one hand, the techniques available for studying surfaces, both experimental and theoretical, have grown in number and in sophistication. On the other hand, surface science has been applied to an increasing number of areas of technology, such as catalysis, semicon­ ductor processing, new materials development, corrosion prevention, adhesion and tribology. . There is, however, no sharp division between fundamental and applied surface science. New techniques can immediately be applied to technologically important problems. Improvements in understanding of fundamental phenomena such as epi­ taxial growth of one metal on another, or the bonding of hydrocarbons to metal sur­ faces, to name just two examples, have direct consequences for technology. Surface science has also become very much an interdisciplinary subject; physics, chemistry, materials science, chemical and electronical engineering all draw upon and contribute to surface science. The intimate relationship between principles and applications of surface science forms the theme of this proceedings volume. The contributions were all presented as invited lectures at an Australian-German Workshop on Surface Science held at Coogee Beach, Sydney, Australia, in December 1991. The contributors, all active surface scientists in their respective countries, were asked to highlight recent develop­ ments in their own areas of activity involving new techniques, advances in funda­ mental understanding or new applications in technology.


Condensed-Matter Physics Helium-Atom-Streuung Oberflächenphysik Physikalische Chemie Surface science chemistry materials science metal physical chemistry semiconductor surface surface physics thin films

Editors and affiliations

  • Russel F. Howe
    • 1
  • Robert N. Lamb
    • 1
  • Klaus Wandelt
    • 2
  1. 1.Department of Physical ChemistryUniversity of New South WalesKensingtonAustralia
  2. 2.Institut für Physikalische und Theoretische ChemieUniversität BonnBonnGermany

Bibliographic information

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