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Ion Implantation Techniques

Lectures given at the Ion Implantation School in Connection with Fourth International Conference on Ion Implantation: Equipment and Techniques Berchtesgaden, Fed. Rep. of Germany, September 13–15, 1982

  • Heiner Ryssel
  • Hans Glawischnig

Part of the Springer Series in Electrophysics book series (SSEP, volume 10)

Table of contents

  1. Front Matter
    Pages I-XII
  2. Machine Aspects of Ion Implantation

    1. Front Matter
      Pages 1-1
    2. Hans Glawischnig
      Pages 3-21
    3. D. Aitken
      Pages 23-71
    4. Charles M. McKenna
      Pages 73-103
    5. R. Bustin, P. H. Rose
      Pages 105-120
  3. Ion Ranges in Solids

    1. Front Matter
      Pages 121-121
    2. J. P. Biersack, J. F. Ziegler
      Pages 122-156
    3. J. P. Biersack, J. F. Ziegler
      Pages 157-176
    4. Heiner Ryssel
      Pages 177-205
  4. Measuring Techniques and Annealing

    1. Front Matter
      Pages 207-207
    2. P. L. F. Hemment
      Pages 209-234
    3. M. I. Current, D. S. Perloff, L. S. Gutai
      Pages 235-253
    4. P. Eichinger, H. Ryssel
      Pages 255-297
    5. Siegfried Mader
      Pages 299-316
  5. Appendix: Modern Ion Implantation Equipment

  6. Back Matter
    Pages 367-372

About these proceedings

Keywords

Absorption Apertur Plasmat computer design development machine material mechanisms model production scattering semiconductor spectroscopy units

Editors and affiliations

  • Heiner Ryssel
    • 1
  • Hans Glawischnig
    • 2
  1. 1.Frauenhofer — Institut für FestkörpertechnologieMünchen 60Fed. Rep. of Germany
  2. 2.Siemens AGMünchen 80Fed. Rep. of Germany

Bibliographic information

  • DOI https://doi.org/10.1007/978-3-642-68779-2
  • Copyright Information Springer-Verlag Berlin Heidelberg 1982
  • Publisher Name Springer, Berlin, Heidelberg
  • eBook Packages Springer Book Archive
  • Print ISBN 978-3-642-68781-5
  • Online ISBN 978-3-642-68779-2
  • Series Print ISSN 0172-5734
  • Buy this book on publisher's site
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