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Kinetics of Metal-Gas Interactions at Low Temperatures

Hydriding, Oxidation, Poisoning

  • Eckehard Fromm

Part of the Springer Series in Surface Sciences book series (SSSUR, volume 36)

Table of contents

  1. Front Matter
    Pages I-XIII
  2. Eckehard Fromm
    Pages 1-4
  3. Eckehard Fromm
    Pages 5-27
  4. Eckehard Fromm
    Pages 28-40
  5. Eckehard Fromm
    Pages 41-77
  6. Eckehard Fromm
    Pages 78-122
  7. Eckehard Fromm
    Pages 123-155
  8. Back Matter
    Pages 197-201

About this book

Introduction

Kinetics of Metal-Gas Interactions at Low Temperatures is devoted to the formation of natural oxide films. These thin surface layers are produced instantaneously when oxygen or water vapor is present in the gas atmosphere. They are responsible for corrosion behavior, for wear and friction of metallic materials, and also for hydrogen embrittlement and poisoning of catalytic surface reactions. Oxidation is a hindrance in surface science and in modern thin-film manufacturing. It can be reliably avoided only with expensive ultra-high vacuum techniques. Despite the practical relevance of the topic, quantitative data are sparse and the few papers published on low-temperature oxidation provide mainly qualitative information. This monograph presents an introduction to the subject in a tutorial style. It demonstrates how complex metal-gas interactions can be analyzed by standard procedures of chemical kinetics, and simulated by reaction models. Typical features of metal-gas reactions observed at ambient and elevated temperatures are illustrated by experimental results. Possible reaction mechanisms are described both by approximations and by advanced models. Rate and time laws describe the limiting cases and the more realistic situation where, in an overall reaction, several crucial partial steps must be considered, namely, adsorption onto the surface and the diffusion of charged or uncharged defects in metallic or semiconducting surface layers.

Keywords

Chemisorption Physisorption Surface science adsorption crystal defects diffusion electron electronic structure ellipsometry hydrogen kinetics scattering simulation tunneling

Authors and affiliations

  • Eckehard Fromm
    • 1
  1. 1.Max-Planck-Institut für MetallforschungStuttgartGermany

Bibliographic information

  • DOI https://doi.org/10.1007/978-3-642-60311-2
  • Copyright Information Springer-Verlag Berlin Heidelberg 1998
  • Publisher Name Springer, Berlin, Heidelberg
  • eBook Packages Springer Book Archive
  • Print ISBN 978-3-540-63975-6
  • Online ISBN 978-3-642-60311-2
  • Series Print ISSN 0931-5195
  • Buy this book on publisher's site
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