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© 2002

Noncontact Atomic Force Microscopy

  • S. Morita
  • R. Wiesendanger
  • E. Meyer
Book

Part of the NanoScience and Technology book series (NANO)

Table of contents

  1. Front Matter
    Pages I-XVIII
  2. Seizo Morita
    Pages 1-10
  3. Franz J. Giessibl
    Pages 11-46
  4. Seizo Morita, Yasuhiro Sugawara
    Pages 47-77
  5. Roland Bennewitz, Martin Bammerlin, Ernst Meyer
    Pages 93-107
  6. Michael Reichling, Clemens Barth
    Pages 109-123
  7. Hirotaka Hosoi, Kazuhisa Sueoka, Kazunobu Hayakawa, Koichi Mukasa
    Pages 125-134
  8. Ken-ichi Fukui, Yasuhiro Iwasawa
    Pages 167-181
  9. Yasuhiro Sugawara
    Pages 183-192
  10. Hirofumi Yamada
    Pages 193-213
  11. Akira Sasahara, Hiroshi Onishi
    Pages 215-231
  12. Wolf Allers, Alexander Schwarz, Udo D. Schwarz
    Pages 233-256
  13. Masaru Tsukada, Naruo Sasaki, Michel Gauthier, Katsunori Tagami, Satoshi Watanabe
    Pages 257-278
  14. San-Huang Ke, Tsuyoshi Uda, Kiyoyuki Terakura, Ruben Pérez, Ivan Štich
    Pages 279-304
  15. Adam Foster, Alexander Shluger, Clemens Barth, Michael Reichling
    Pages 305-347
  16. Hendrik Hölscher
    Pages 349-369
  17. Michel Gauthier, Lev Kantorovich, Masaru Tsukada
    Pages 371-394

About this book

Introduction

Since 1995, the noncontact atomic force microscope (NC-AFM) has achieved remarkable progress. Based on nanomechanical methods, the NC-AFM detects the weak attractive force between the tip of a cantilever and a sample surface. This method has the following characteristics: it has true atomic resolution; it can measure atomic force interactions, i.e. it can be used in so-called atomic force spectroscopy (AFS); it can also be used to study insulators; and it can measure mechanical responses such as elastic deformation. This is the first book that deals with all of the emerging NC-AFM issues.

Keywords

AFM Bias Helium-Atom-Streuung Noncontact atomic True atomic resolution deformation experiment measurement microscopy oxides semiconductor semiconductors spectroscopy surface temperature

Editors and affiliations

  • S. Morita
    • 1
  • R. Wiesendanger
    • 2
  • E. Meyer
    • 3
  1. 1.Department of Electronic Engineering, Graduate School of EngineeringOsaka UniversitySuitaJapan
  2. 2.Institute of Applied Physics, MARCHUniversity of HamburgHamburgGermany
  3. 3.Department of Physics and Astronomy, Condensed Matter DivisionUniversity of BaselBaselSwitzerland

Bibliographic information

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Reviews

"This book gives a comprehensive overview of the state-of-the-art of this dynamic force microscopy technique in 20 chapters, each written by experts in the field. It covers the theoretical basis, as well as applications to semiconducting surfaces, ionic crystals, metal oxides, and organic molecular systems including thin films, polymers, and nucleic acids . . . There are unsolved questions about the mechanisms responsible for atomic resolution but, as this well-written book displays, there has been tremendous progress in basic understanding of the technique and fascinating new applications continue to arise . . . With an increased understanding of NC-AFM, as demonstrated in this book, we are certain to see further progress in the near future."

–Materials Today