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© 2018

Physical Design and Mask Synthesis for Directed Self-Assembly Lithography

Book
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Part of the NanoScience and Technology book series (NANO)

Table of contents

  1. Front Matter
    Pages i-xiv
  2. Seongbo Shim, Youngsoo Shin
    Pages 1-12
  3. Physical Design Optimizations

    1. Front Matter
      Pages 13-13
    2. Seongbo Shim, Youngsoo Shin
      Pages 15-24
    3. Seongbo Shim, Youngsoo Shin
      Pages 25-39
    4. Seongbo Shim, Youngsoo Shin
      Pages 41-50
    5. Seongbo Shim, Youngsoo Shin
      Pages 51-61
    6. Seongbo Shim, Youngsoo Shin
      Pages 63-73
  4. Mask Synthesis and Optimizations

    1. Front Matter
      Pages 75-75
    2. Seongbo Shim, Youngsoo Shin
      Pages 77-92
    3. Seongbo Shim, Youngsoo Shin
      Pages 93-115
    4. Seongbo Shim, Youngsoo Shin
      Pages 117-130
    5. Seongbo Shim, Youngsoo Shin
      Pages 131-133
  5. Back Matter
    Pages 135-138

About this book

Introduction

This book discusses physical design and mask synthesis of directed self-assembly lithography (DSAL). It covers the basic background of DSAL technology, physical design optimizations such as placement and redundant via insertion, and DSAL mask synthesis as well as its verification. Directed self-assembly lithography (DSAL) is a highly promising patterning solution in sub-7nm technology.

Keywords

VLSI CAD for DSA Physical Design for DSA DSA-Friendly VLSI Design DSA.Aware Placement DSA-Aware Routing DSA-Aware Mask Optimization DSA-Aware OPC DSA Verification Multi-Patterning with DSA Inverse DSA Nanolithography Computational Litography

Authors and affiliations

  1. 1.Samsung ElectronicsHwasungKorea (Republic of)
  2. 2.KAISTDaejeonKorea (Republic of)

About the authors

Seongbo Shim received B.S. and M.S. degrees in physics from Seoul National University, Korea, in 2004 and 2006 respectively, and a Ph.D. in electrical engineering from KAIST, Korea, in 2016. From 2006 to 2012, he was with the Semiconductor R&D Center, Samsung Electronics, where he was a Senior Engineer working on photolithography, computational lithography, optical proximity correction (OPC), and design for manufacturability (DFM) for advanced technologies. He has authored more than 40 papers on lithography, OPC, and DFM. He is the holder of 15 patents. His research interests include mask synthesis algorithms, VLSI CAD for the design-manufacturing interface, design technology co-optimization (DTCO) for emerging technologies, and machine learning for lithography optimizations.

Youngsoo Shin received B.S., M.S., and Ph.D. degrees in Electronics Engineering from Seoul National University, Korea. From 2001 to 2004, he was a Research Staff Member at the IBM T. J. Watson Research Center, Yorktown Heights, NY, USA. In 2004, he joined the Department of Electrical Engineering, KAIST, Korea, where he is currently a professor. He has served as a Program Chair of ICCD in 2014 and VLSI-SoC in 2015, and as a General Chair of ASP-DAC in 2018. He is an associate editor of IEEE Transactions on CAD and IEEE Design and Test. He is an IEEE Fellow.

Bibliographic information

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