© 2016

New Perspectives on Surface Passivation: Understanding the Si-Al2O3 Interface


Part of the Springer Theses book series (Springer Theses)

Table of contents

  1. Front Matter
    Pages i-xxviii
  2. Lachlan E. Black
    Pages 1-13
  3. Lachlan E. Black
    Pages 15-28
  4. Lachlan E. Black
    Pages 67-77
  5. Lachlan E. Black
    Pages 79-96
  6. Lachlan E. Black
    Pages 97-139
  7. Lachlan E. Black
    Pages 141-153
  8. Lachlan E. Black
    Pages 177-180
  9. Back Matter
    Pages 181-204

About this book


The book addresses the problem of passivation at the surface of crystalline silicon solar cells. More specifically, it reports on a high-throughput, industrially compatible deposition method for Al2O3, enabling its application to commercial solar cells. One of the main focus is on the analysis of the physics of Al2O3 as a passivating dielectric for silicon surfaces. This is accomplished through a comprehensive study, which moves from the particular, the case of aluminium oxide on silicon, to the general, the physics of surface recombination, and is able to connect theory with practice, highlighting relevant commercial applications.


Surface Recombination Theory Passivation Performance Passivating Dielectrics Deposition of Al2O3 Atmospheric Pressure Chemical Vapour Deposition(APCVD) Aluminiumoxide Thin Films APCVD Aluminium Oxide Crystalline Silicon Solar Cells Recombination at p-type Surfaces High-throughput Deposition Methods

Authors and affiliations

  1. 1.The Australian National UniversityResearch School of EngineeringCanberraAustralia

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