Flash Lamp Annealing

From Basics to Applications

  • Lars Rebohle
  • Slawomir Prucnal
  • Denise Reichel

Part of the Springer Series in Materials Science book series (SSMATERIALS, volume 288)

Table of contents

  1. Front Matter
    Pages i-xviii
  2. Lars Rebohle
    Pages 1-14
  3. Lars Rebohle
    Pages 15-70
  4. Lars Rebohle, Denise Reichel
    Pages 71-129
  5. Slawomir Prucnal, Lars Rebohle, Denise Reichel
    Pages 131-232
  6. Slawomir Prucnal, Lars Rebohle, Denise Reichel
    Pages 233-282
  7. Back Matter
    Pages 283-288

About this book


This book provides a comprehensive survey of the technology of flash lamp annealing (FLA) for thermal processing of semiconductors. It gives a detailed introduction to the FLA technology and its physical background. Advantages, drawbacks and process issues are addressed in detail and allow the reader to properly plan and perform their own thermal processing. Moreover, this books gives a broad overview of the applications of flash lamp annealing, including a comprehensive literature survey. Several case studies of simulated temperature profiles in real material systems give the reader the necessary insight into the underlying physics and simulations. This book is a valuable reference work for both novice and advanced users.


Millisecond annealing FLA assisted deposition Semiconductor nanostructures Transparent conducting oxides High-k materials High-k dielectrics

Authors and affiliations

  • Lars Rebohle
    • 1
  • Slawomir Prucnal
    • 2
  • Denise Reichel
    • 3
  1. 1.Institute of Ion Beam Physics and Material ResearchHemholtz-Zentrum Dresden-RossendorfDresdenGermany
  2. 2.Institute of Ion Beam Physics and Material ResearchHelmholtz-Zentrum Dresden-RossendorfDresdenGermany
  3. 3.AKAD UniversityStuttgartGermany

Bibliographic information

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