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Particles in Gases and Liquids 2

Detection, Characterization, and Control

  • K. L. Mittal

Table of contents

  1. Front Matter
    Pages i-ix
  2. General Overview Papers

  3. Particle Generation and Deposition

    1. Front Matter
      Pages 115-115
    2. K. May, T. Pfeifer, R. J. Schilling
      Pages 129-141
    3. Hwa-Chi Wang, Horng-Yuan Wen, Gerhard Kasper
      Pages 143-154
    4. Scott J. Alberhasky, Richard J. McCluskey, Denis J. Poley
      Pages 155-165
    5. Michael Yost, Arnold Steinman, Al Lieberman
      Pages 167-178
  4. Particles in Gases: Detection, Characterization and Control

    1. Front Matter
      Pages 195-195
    2. W. R. Gerristead Jr., E. F. Ezell, R. Sherman
      Pages 211-221
    3. John Gregg, Peter G. Borden
      Pages 251-260
    4. M. R. Anewalt, P. S. Schabes-Retchkiman, C. E. Lyman
      Pages 261-274
    5. D. A. Jackson, K. B. Tennal, M. K. Mazumder, J. D. Wilson, B. A. Ragent
      Pages 275-283
    6. C. P. Wu, M. K. Mazumder
      Pages 285-295
  5. Particles in Liquids: Detection Characterization and Control

    1. Front Matter
      Pages 305-305
    2. Paul Melanson, Clifford F. Frith
      Pages 335-345
    3. J. S. Batchelder, M. A. Taubenblatt
      Pages 347-353
    4. Joseph Zahka, Donald Grant, Cynthia Myhaver
      Pages 367-382
  6. Back Matter
    Pages 393-407

About this book

Introduction

This book chronicles the proceedings of the Second Symposium on Particles in Gases and Liquids: Detection, Characterization and Control held as a part of the 20th Annual Fine Particle Society meeting in Boston, August 21-25, 1989. As this second symposium was as successful as the prior one, so we have decided to hold symposia on this topic on a regular (biennial) basis and the third symposium in this series is scheduled to be held at the 22nd Annual Meeting of the Fine Particle Society in San Jose, California, July 29-August 2, 1991. l As pointed out in the Preface to the prior volume in this series that recently there has been tremendous concern about yield losses due to unwanted particles, and these unwelcome particles can originate from a legion of sources, including process gases and liquids. Also all signals indicate that in the future manufacture of sophisticated and sensitive microelectronic components (with shrinking dimensions) and other precision parts, the need for detection, characterization, analysis and control of smaller and smaller particles will be more intensified.

Keywords

aerosol Diffusion water

Editors and affiliations

  • K. L. Mittal
    • 1
  1. 1.IBM U.S. Technical EducationThornwoodUSA

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