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Thin Film Metal-Oxides

Fundamentals and Applications in Electronics and Energy

  • Shriram Ramanathan

Table of contents

  1. Front Matter
    Pages i-xvi
  2. Dmitry Ruzmetov, Shriram Ramanathan
    Pages 51-94
  3. Jiwei Lu, Kevin G. West, Stuart A. Wolf
    Pages 95-129
  4. Rainer Bruchhaus, Rainer Waser
    Pages 131-167
  5. Yasuyuki Hikita, Harold Y. Hwang
    Pages 169-204
  6. Galen D. Stucky, Michael H. Bartl
    Pages 255-279
  7. Su Ying Quek, Efthimios Kaxiras
    Pages 281-301
  8. Timothy P. Holme, Hong Huang, Fritz B. Prinz
    Pages 303-328
  9. Back Matter
    Pages 329-337

About this book

Introduction

Thin Film Metal-Oxides provides a representative account of the fundamental structure-property relations in oxide thin films. Functional properties of thin film oxides are discussed in the context of applications in emerging electronics and renewable energy technologies. Readers will find a detailed description of deposition and characterization of metal oxide thin films, theoretical treatment of select properties and their functional performance in solid state devices, from leading researchers.

Scientists and engineers involved with oxide semiconductors, electronic materials and alternative energy will find Thin Film Metal-Oxides a useful reference.

 

Keywords

advanced transistor devices atomic layer deposition catalysis chemistry defect chemistry electron microscopy electronics film gate dielectrics low temperature synthesis metal-oxides renewable energy semiconductor stoichiometry thin films

Editors and affiliations

  • Shriram Ramanathan
    • 1
  1. 1.School of Engineering & Applied SciencesHarvard UniversityCambridgeU.S.A.

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