Low-Frequency Noise In Advanced Mos Devices

  • Martin von Haartman
  • Mikael Östling

Part of the Analog Circuits and Signal Processing Series book series (ACSP)

Table of contents

  1. Front Matter
    Pages I-XV
  2. Martin von Haartman, Mikael Östling
    Pages 1-26
  3. Martin von Haartman, Mikael Östling
    Pages 27-51
  4. Martin von Haartman, Mikael Östling
    Pages 53-102
  5. Martin von Haartman, Mikael Östling
    Pages 103-173
  6. Martin von Haartman, Mikael Östling
    Pages 175-187
  7. Back Matter
    Pages 211-216

About this book


Low-Frequency Noise in Advanced CMOS Devices begins with an introduction to noise, describing the fundamental noise sources and basic circuit analysis. The characterization of low-frequency noise is discussed in detail and useful practical advice is given. The various theoretical and compact low-frequency (1/f) noise models in MOS transistors are treated extensively providing an in-depth understanding of the low-frequency noise mechanisms and the potential sources of the noise in MOS transistors. Advanced CMOS technology including nanometer scaled devices, strained Si, SiGe, SOI, high-k gate dielectrics, multiple gates and metal gates are discussed from a low-frequency noise point of view. Some of the most recent publications and conference presentations are included in order to give the very latest view on the topics. The book ends with an introduction to noise in analog/RF circuits and describes how the low-frequency noise can affect these circuits.


1/f noise CMOS CMOS technology Leistungsfeldeffekttransistor MOSFETs Transistor analog circuits field-effect transistor flicker noise low-frequency noise metal oxide semiconductur field-effect transistor

Authors and affiliations

  • Martin von Haartman
    • 1
  • Mikael Östling
    • 1
  1. 1.KTH, Royal Institute of TechnologySchool of Information and Communication TechnologyKistaSweden

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