© 2005

Microscopy of Semiconducting Materials

Proceedings of the 14th Conference, April 11–14, 2005, Oxford, UK

  • A. G. Cullis
  • J. L. Hutchison
Conference proceedings

Part of the Springer Proceedings in Physics book series (SPPHY, volume 107)

Table of contents

  1. Front Matter
    Pages I-XVI
  2. Epitaxy: Wide Band-Gap Nitrides

    1. Front Matter
      Pages 1-1
    2. B Daudin, J -L Rouvière, D Jalabert, J Coraux, V Favre-Nicolin, H Renevier et al.
      Pages 3-12
    3. N K van der Laak, R A Oliver, M J Kappers, C McAleese, C J Humphreys
      Pages 13-16
    4. A Pretorius, T Yamaguchi, M Schowalter, R Kröger, C Kübel, D Hommel et al.
      Pages 17-20
    5. Y B Kwon, J H Je, P Ruterana, G Nouet
      Pages 21-24
    6. J S Barnard, D M Graham, T M Smeeton, M J Kappers, P Dawson, M Godfrey et al.
      Pages 25-28
    7. Rachel A Oliver, Nicole K van der Laak, Menno J Kappers, Colin J Humphreys
      Pages 29-32
    8. M Hawkridge, D Cherns
      Pages 45-50
    9. P Vennéguès, J M Bethoux, Z Bougrioua, M Azize, P De Mierry, O Tottereau
      Pages 51-54
    10. P D Cherns, C McAleese, M J Kappers, C J Humphreys
      Pages 55-58
    11. R Datta, M J Kappers, J S Barnard, C J Humphreys
      Pages 59-62
    12. R T Murray, P J Parbrook, G Hill, I M Ross
      Pages 63-66
    13. P Singh, P Ruterana, G Nouet, A Jain, J M Redwing, M Wojdak
      Pages 67-70
    14. A Delimitis, Ph Komninou, Th Kehagias, Th Karakostas, E Dimakis, A Georgakilas et al.
      Pages 71-74
    15. J Deneen, S Kumar, C R Perrey, C B Carter
      Pages 83-86
  3. Epitaxy: Silicon-Germanium Alloys

    1. Front Matter
      Pages 87-87

About these proceedings


This is a long-established international biennial conference series, organised in conjunction with the Royal Microscopical Society, Oxford, the Institute of Physics, London and the Materials Research Society, USA. The 14th conference in the series focused on the most recent advances in the study of the structural and electronic properties of semiconducting materials by the application of transmission and scanning electron microscopy. The latest developments in the use of other important microcharacterisation techniques were also covered and included the latest work using scanning probe microscopy and also X-ray topography and diffraction. Developments in materials science and technology covering the complete range of elemental and compound semiconductors are described in this volume.


electron microscope electron microscopy integrated circuit nanostructures plasma processing scanning probe microscopy semiconductor materials transmission electron microscopy

Editors and affiliations

  • A. G. Cullis
    • 1
  • J. L. Hutchison
    • 2
  1. 1.Department of Electronic and Electrical EngineeringUniversity of SheffieldSheffieldUK
  2. 2.Department of MaterialsUniversity of OxfordOxfordUK

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