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Flexible Carbon-rich Al2O3 Interlayers for Moisture Barrier Films by a Spatially-Resolved Atomic Layer Deposition Process

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Abstract

In this study, we developed effective carbon-rich Al2O3 interlayers for flexible moisture barrier films. The carbon-rich Al2O3 films were deposited with excessive supply of trimethylaluminum (TMA) precursor. The five-layer structure was made with alternate layers of low-carbon Al2O3 and carbon-rich Al2O3 and the water vapor transmission rate (WVTR) of 3.3 × 10 −4 g/(m2·day) was demonstrated. The WVTR of the multilayer films is reduced by 36% compared to 25 nm thick single Al2O3 barrier film. The WVTR of the five-layer film shows increase of 86% after 1,000 bending at a 1.5 cm radius, while single Al2O3 thin films increased by 367%.

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Authors and Affiliations

  1. School of Chemical Engineering, Sungkyunkwan University (SKKU), Suwon, 16419, Korea

    Sang Heon Yong, Sun Jung Kim, Jang Soon Park, Sung Min Cho & Heeyeop Chae

  2. SKKU Advanced Institute of Nanotechnology (SAINT), Sungkyunkwan University (SKKU), Suwon, 16419, Korea

    Hyung June Ahn & Heeyeop Chae

Authors
  1. Sang Heon Yong
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  2. Sun Jung Kim
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  3. Jang Soon Park
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  4. Sung Min Cho
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  5. Hyung June Ahn
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  6. Heeyeop Chae
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Correspondence to Heeyeop Chae.

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Yong, S.H., Kim, S.J., Park, J.S. et al. Flexible Carbon-rich Al2O3 Interlayers for Moisture Barrier Films by a Spatially-Resolved Atomic Layer Deposition Process. J. Korean Phys. Soc. 73, 40–44 (2018). https://doi.org/10.3938/jkps.73.40

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  • DOI: https://doi.org/10.3938/jkps.73.40

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