Journal of the Korean Physical Society

, Volume 75, Issue 5, pp 373–379 | Cite as

Analysis of a Non-Evaporable Getter of Ti-Al-Zr Thin Film with Enhanced Performance Used for Ultra-High Vacuum Generation

  • Muhammad Khalid Alamgir
  • M. IkramEmail author
  • Ghalib Hussain Mughal
  • Ghulam Asghar
  • Shafiq ur Rehman
  • S. Qaseem
  • M. Kamran
  • Amir Ullah
  • Sartaj Khan


Non-evaporable getter (NEG) thin films of Ti-Al-Zr and Ti-Zr were prepared on stainless-steel substrate by using the cathodic arc deposition technique. Scanning electron microscopy (SEM), energy-dispersive X-ray spectroscopy (EDX), X-ray diffraction (XRD), and in-situ X-ray photo-electron spectroscopy (XPS) were used to analyze the getter behavior of the non-evaporable getter thin films. The SEM images displayed the porous and rough surfaces of the thin films, which is an indication of high adsorption and sticking probabilities for the residual gases present in the chamber. The volume elemental composition of the thin films was measured by using EDX. The XRD patterns of the synthesized thin films indicated that the films had an amorphous nature and high structural stability. The in-situ X-ray photoelectron spectroscopy (XPS) studies revealed that the superficial layers disappeared when the non-evaporable getter of Ti-Al-Zr thin films was heated at a temperature below 250 °C for 30 minutes, there by activating the surface. However, for Ti-Zr thin films, no reasonable activation was observed at 250 °C. This outcome reveals that thin films of Ti-Al-Zr are good for reducing the outgassing and producing an ultra-high vacuum.


Ultra-high vacuum Non-evaporable getter Cathodic arc XPS and EDX analyses 

PACS numbers

61.05.C− 61.05.cp 62.23.−c 62.30.+d 


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We are highly thankful to M. Shoaib and M. Shafi of “Quench age” Sialkot, Mr. Tahir of “IST” Islamabad, and Babar Rashid and Mumtaz Irfan of “NINVAST” for their support throughout the work.


  1. [1]
    C. Park, S. Chung and P. Manini, J. Vac. Sci. Tech. A 29, 011012 (2011).CrossRefGoogle Scholar
  2. [2]
    C. Benvenuti et al., Vacuum 53, 219 (1999).ADSCrossRefGoogle Scholar
  3. [3]
    E. Maccallini et al., AIP Conf. Proc. 1451, 24 (2012).ADSCrossRefGoogle Scholar
  4. [4]
    C. Benvenuti, Proceedings of EPAC (Stockholm, June, 1998).Google Scholar
  5. [5]
    R. Sharma et al., J. Phys.: Conf. Ser. 114, 012050 (2008).Google Scholar
  6. [6]
    S. PalDey, S. Deevi and T. Alford, Intermetallics 12, 985 (2004).CrossRefGoogle Scholar
  7. [7]
    B. Ferrario, Introduzione alla Tecnologia del Vuoto, Editore: Pàtron (1999), Vol. 2.Google Scholar
  8. [8]
    M. Lozano and J. Fraxedas, Surf. Int. Anal. 30, 623 (2000).CrossRefGoogle Scholar
  9. [9]
    J.-H. Yoon et al., J. Anal. Sci. Tech. 1, 61 (2010).CrossRefGoogle Scholar
  10. [10]
    N. H. Malik, A. Al-Arainy and M. Qureshi, Electrical Insulation in Power Systems (Marcel Dekker, Inc., 1998).Google Scholar
  11. [11]
    D. A. Shirley, Phys. Rev. B 5, 4709 (1972).ADSCrossRefGoogle Scholar
  12. [12]
    C. C. Li et al., Surf. Coat. Tech. 200, 1351 (2005).CrossRefGoogle Scholar
  13. [13]
    X. Guo, Y. Q. Sun and K. Cui, Sens. Actuators B Chem. 31, 139 (1996).CrossRefGoogle Scholar
  14. [14]
    C. C. Lin, Y. P. Chang, H. B. Lin and C. H. Lin, Nano. Res. Lett. 7, 1 (2012).ADSCrossRefGoogle Scholar
  15. [15]
    R. Castillo, B. Koch, P. Ruiz and B. Delmon, J. Catal. 161, 524 (1996).CrossRefGoogle Scholar
  16. [16]
    H. Ikawa, T. Yamada, K. Kojima and S. Matsumoto, J. Am. Ceram. Soc. 74, 1459 (1991).CrossRefGoogle Scholar
  17. [17]
    H. Noda et al., Chem. Inf. 18, (1987).Google Scholar
  18. [18]
    P. Chiggiato and P. C. Pinto, Thin Solid Films 515, 382 (2006).ADSCrossRefGoogle Scholar
  19. [19]
    C. Wagner, D. Zatko and R. Raymond, Anal. Chem. 52, 1445 (1980).CrossRefGoogle Scholar
  20. [20]
    A. Lachkar, A. Selmani, E. Sacher and M. Leclerc, Syn. Metals 72, 81 (1995).CrossRefGoogle Scholar
  21. [21]
    A. Shchukarev and D. Korolkov, Open Chem. 2, 347 (2004).CrossRefGoogle Scholar

Copyright information

© The Korean Physical Society 2019

Authors and Affiliations

  • Muhammad Khalid Alamgir
    • 1
  • M. Ikram
    • 2
    Email author
  • Ghalib Hussain Mughal
    • 3
  • Ghulam Asghar
    • 4
  • Shafiq ur Rehman
    • 5
  • S. Qaseem
    • 6
  • M. Kamran
    • 7
  • Amir Ullah
    • 8
  • Sartaj Khan
    • 9
  1. 1.NCP IslamabadNational Institute of Vacuum Science and TechnologyIslamabadPakistan
  2. 2.Department of PhysicsHazara UniversityMansehraPakistan
  3. 3.Department of PhysicsThe University of Poonch Rawalakot Azad Jammu & KashmirJammu & KashmirPakistan
  4. 4.NCP IslamabadNational Institute of Vacuum Science and TechnologyIslamabadPakistan
  5. 5.Quench AgeOld Industrial Area SialkotSialkotPakistan
  6. 6.Department of PhysicsFederal Urdu University of Arts, Science and TechnologyKarachiPakistan
  7. 7.Department of Electrical EngineeringCOMSATS Institute of Information Technology Wah campusIslamabadPakistan
  8. 8.Department of PhysicsIslamia CollegePeshawarPakistan
  9. 9.College of Underwater Acoustic EngineeringHarbin Engineering UniversityHerbinChina

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