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Nanometer Scale Lithography with Evaporated Polystyrene

  • Engineering Physics
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Moscow University Physics Bulletin Aims and scope

Abstract

We report on a fabrication method of extremely small metallic nanostructures which uses commercially available polystyrene with low molecular weight as a negative resist for electron-beam lithography. The samples were covered with polystyrene by physical vapor deposition. The method allows to form structures with a high (5–10 nm) spatial resolution and a high yield on non-uniform arbitrary shaped surfaces. The technological processes for forming line or dot arrays, electrodes with nanogaps, and radially located electrodes were developed. The process parameters are presented in this work. The possibility of fabrication of nanostructures on a cantilever tip apex of the scanning probe microscope was also demonstrated.

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Authors and Affiliations

  1. Department of Physics, Moscow State University, Moscow, 119991, Russia

    G. A. Zharik, S. A. Dagesyan, E. S. Soldatov, D. E. Presnov & V. A. Krupenin

  2. Skobeltsyn Institute of Nuclear Physics, Moscow State University, Moscow, 119991, Russia

    D. E. Presnov

Authors
  1. G. A. Zharik
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  2. S. A. Dagesyan
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  3. E. S. Soldatov
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  4. D. E. Presnov
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  5. V. A. Krupenin
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Corresponding author

Correspondence to G. A. Zharik.

Additional information

Original Russian Text © G.A. Zharik, S.A. Dagesyan, E.S. Soldatov, D.E. Presnov, V.A. Krupenin, 2017, published in Vestnik Moskovskogo Universiteta, Seriya 3: Fizika, Astronomiya, 2017, No. 6, pp. 121–126.

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Zharik, G.A., Dagesyan, S.A., Soldatov, E.S. et al. Nanometer Scale Lithography with Evaporated Polystyrene. Moscow Univ. Phys. 72, 627–632 (2017). https://doi.org/10.3103/S0027134917060224

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  • DOI: https://doi.org/10.3103/S0027134917060224

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