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Tribological behavior of TiN films depositid by reactive magnetron sputtering under low pressure

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Abstract

The effect of deposition conditions on the tribological behavior of titanium nitride thin films produced by reactive magnetron sputtering has been studied. Dependences of the hardness, the width of the friction track, the friction coefficient, and the volume wear of the TiN films on the N2 reactive gas flow rate have been obtained. Conditions of deposition under which the coatings with the best tribological characteristics are formed have been determined.

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Authors and Affiliations

  1. Belarusian State University of Informatics and Radioelectronics, ul. P. Brovki 6, Minsk, 220013, Belarus

    M. V. Ermolenko, S. M. Zavadski, D. A. Golosov & S. N. Melnikov

  2. Southern Federal University, ul. Shevchenko 2, Taganrog, 347928, Russia

    E. G. Zamburg

Authors
  1. M. V. Ermolenko
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  2. S. M. Zavadski
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  3. D. A. Golosov
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  4. S. N. Melnikov
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  5. E. G. Zamburg
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Corresponding author

Correspondence to S. M. Zavadski.

Additional information

Original Russian Text © M.V. Ermolenko, S.M. Zavadski, D.A. Golosov, S.N. Melnikov, E.G. Zamburg, 2016, published in Trenie i Iznos, 2016, Vol. 37, No. 3, pp. 369–373.

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Ermolenko, M.V., Zavadski, S.M., Golosov, D.A. et al. Tribological behavior of TiN films depositid by reactive magnetron sputtering under low pressure. J. Frict. Wear 37, 289–292 (2016). https://doi.org/10.3103/S1068366616030065

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  • DOI: https://doi.org/10.3103/S1068366616030065

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