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Growth, structure and properties of magnetron sputtered ultra-thin WTi films

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Refractory metal alloy WTi films were elaborated by magnetron sputtering from an alloyed target (W:Ti ∼ 70:30 at%). Film continuity threshold has been determined at 4.5 ± 0.2 nm using in situ surface differential reflectance (SDR) technique. Prior to film continuity, deposition of a continuous interfacial layer is suggested by both in situ and real-time SDR and wafer-curvature techniques. After continuity, WxTi1-x films (9.5 nm thick WTi films) have a body-centered structure with a {110} fiber texture. Composition (x) and microstructure can be tuned varying working pressure. A transition from compressive to tensile residual stresses was observed by ex situ XRD and wafer-curvature methods. Size dependent resistivity is obtained and slightly varies as a function of working pressure.

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Authors and Affiliations

  1. Institut P’, CNRS-University of Poitiers, SP2MI, Bd Marie et Pierre Curie, BP30179, 86962, Futuroscope Chasseneuil, France

    A. Le Priol, E. Le Bourhis, P.-O. Renault, L. Simonot & G. Abadias

  2. Sagem Défense Sécurité, 72-74 rue de la Tour Billy, BP72, 95101, Argenteuil, France

    A. Le Priol, P. Muller & H. Sik

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  1. A. Le Priol
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  2. E. Le Bourhis
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  3. P.-O. Renault
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  4. L. Simonot
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  5. G. Abadias
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  6. P. Muller
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  7. H. Sik
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Le Priol, A., Le Bourhis, E., Renault, PO. et al. Growth, structure and properties of magnetron sputtered ultra-thin WTi films. MRS Online Proceedings Library 1580, 204 (2013). https://doi.org/10.1557/opl.2013.575

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