High Yield Polymer MEMS Process for CMOS/MEMS Integration

MRS Online Proceedings Library volume 1299, Article number: 412 (2011) Cite this article

Abstract

MEMS community is increasingly using SU-8 as a structural material because it is self-patternable, compliant and needs a low thermal budget. While the exposed layers act as the structural layers, the unexposed SU-8 layers can act as the sacrificial layers, thus making it similar to a surface micromachining process. A sequence of exposed and unexposed SU-8 layers should lead to the development of a SU-8 based MEMS chip integrated with a pre-processed CMOS wafer. A process consisting of optical lithography to obtain SU-8 structures on a CMOS wafer is described in this paper.

This is a preview of subscription content, access via your institution.

Access options

Buy single article

Instant access to the full article PDF.

US$ 39.95

Tax calculation will be finalised during checkout.

References

  1. 1.

    Vora K D, Shew B Y, Harvey E C, Hayes J P and Peele A G J. Micromech. Microeng. 15, 978 (2005).

    Article  Google Scholar 

  2. 2.

    Jiang K, Lancaster M J, Llamas-Garro I and Jin P J. Micromech. Microeng. 15, 1522 (2005)

    Article  Google Scholar 

  3. 3.

    Williams J D and Wang W Microsyst.Technol. 10, 694 (2004)

    CAS  Article  Google Scholar 

  4. 4.

    Zhang J, Chan-Park M B and Conner S R Lab on a Chip 4 646 (2004)

  5. 5.

    Chang H-K and Kim Y-K Sensors Actuators A 84, 342 (2000)

  6. 6.

    L. Gammelgaard,P. A. Rasmussen, M. Calleja, P. Vettiger, and A. Boisen Appl. Phy. Lett 88, 113508(2006)

  7. 7.

    Seena V, Anukool Rajorya, Prita Pant, S Mukherji, V Ramgopal Rao Solid State Science, 11, 1606 (2009)

    CAS  Article  Google Scholar 

  8. 8.

    Prashant Mali, Aniruddh Sarkar, Rakesh Lal, Lab on Chip 6 310(2006)

  9. 9.

    Ceyssens F, Puers R J Micromech. Microeng. 16(6) 19(2006)

  10. 10.

    Seidemann V, Rabe J, Feldmann M and Buttgenbach S Microsyst. Technol. 8 348(2002)

  11. 11.

    Bertsch A, Lorenz H and Renaud P Sensors Actuators A 73 14(1999)

  12. 12.

    Chuang Y-J, Tseng F-G, Cheng J-H and LinW-K Sensors Actuators A 103 64(2003)

  13. 13.

    F. H. Tay, J. A. Kan, F. Watt, W. O. Choong J. Micromech. Microeng. 11(1) 27 (2000).

  14. 14.

    I G Foulds and M Parameswaran J. Micromech. Microeng. 16, 2109 (2006)

    Article  Google Scholar 

Download references

Author information

Affiliations

  1. Centre of Excellence in Nanoelectronics, Department of Electrical Engineering, Indian Institute of Technology Bombay, Mumbai, India

    Prasenjit Ray, V. Seena, Prakash R. Apte & Ramgopal Rao

Authors
  1. Prasenjit Ray
    View author publications

    You can also search for this author in PubMed Google Scholar

  2. V. Seena
    View author publications

    You can also search for this author in PubMed Google Scholar

  3. Prakash R. Apte
    View author publications

    You can also search for this author in PubMed Google Scholar

  4. Ramgopal Rao
    View author publications

    You can also search for this author in PubMed Google Scholar

Corresponding author

Correspondence to Prasenjit Ray.

Rights and permissions

Reprints and Permissions

About this article

Cite this article

Ray, P., Seena, V., Apte, P.R. et al. High Yield Polymer MEMS Process for CMOS/MEMS Integration. MRS Online Proceedings Library 1299, 412 (2011). https://doi.org/10.1557/opl.2011.58

Download citation