Routes towards large area, low pressure nanodiamond growth via pulsed microwave linear antenna plasma chemistry

MRS Online Proceedings Library volume 1282, Article number: 301 (2010) Cite this article

Abstract

Current experimental configurations for MW PECVD diamond growth do not allow simple up-scaling towards large areas, which is essential for microelectronic industries and other applications. Another important issue is the reduction of the substrate temperature during diamond growth to enhance the compatibility with wafer processing technologies. Such advantages are provided by MW-linear antenna (LA) plasma applicators, allowing a scalable concept for diamond growing plasmas. In the present work we introduce a novel construction of LA MW applicators designed for nanodiamond growth by using plasmas ranging from continuous wave (CW) to high repetition rates pulsed modes (up to 20 kHz) which advantages are discussed in detail.

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Affiliations

  1. Leybold Optics Dresden GmbH, Dresden, Germany

    Michael Liehr

  2. Institute of Physics, Academy of Sciences of the Czech Republic, v.v.i, Prague 8, Czech Republic

    František Fendrych & Andrew Taylor

  3. IMOMEC division, IMEC, Institute for Materials Research, University Hasselt, Wetenschapspark 1, Diepenbeek, B3590, Belgium

    Miloš Nesládek

Authors
  1. Michael Liehr
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  2. František Fendrych
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  3. Andrew Taylor
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  4. Miloš Nesládek
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Liehr, M., Fendrych, F., Taylor, A. et al. Routes towards large area, low pressure nanodiamond growth via pulsed microwave linear antenna plasma chemistry. MRS Online Proceedings Library 1282, 301 (2010). https://doi.org/10.1557/opl.2011.524

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